Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors
Yao JK(姚建可) ; Xu Cheng ; Ma JY(麻健勇) ; Fang Ming ; Fan ZX(范正修) ; Jin Yunxia ; Zhao Yuanan ; He HB(贺洪波) ; Shao JD(邵建达)
刊名appl. surf. sci.
2009
卷号255期号:9页码:4733
关键词TiO2/SiO2 high reflectors Laser damage Deposition rate Electron beam evaporation Raman spectra Energy dispersive X-ray analysis
ISSN号0169-4332
中文摘要tio2 single layers and tio2/sio2 high reflectors (hr) are prepared by electron beam evaporation at different tio2 deposition rates. it is found that the changes of properties of tio2 films with the increase of rate, such as the increase of refractive index and extinction coefficient and the decrease of physical thickness, lead to the spectrum shift and reflectivity bandwidth broadening of hr together with the increase of absorption and decrease of laser-induced damage threshold. the damages are found of different morphologies: a shallow pit to a seriously delaminated and deep crater, and the different amorphous-to-anatase-to-rutile phase transition processes detected by raman study. the frequency shift of raman vibration mode correlates with the strain in. film. energy dispersive x-ray analysis reveals that impurities and non-stoichiometric defects are two absorption initiations resulting to the laser-induced transformation. (c) 2008 elsevier b. v. all rights reserved.
学科主题光学薄膜
语种英语
WOS记录号WOS:000263542700006
公开日期2009-09-22
内容类型期刊论文
源URL[http://ir.siom.ac.cn/handle/181231/4780]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
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GB/T 7714
Yao JK,Xu Cheng,Ma JY,et al. Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors[J]. appl. surf. sci.,2009,255(9):4733, 4737.
APA 姚建可.,Xu Cheng.,麻健勇.,Fang Ming.,范正修.,...&邵建达.(2009).Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors.appl. surf. sci.,255(9),4733.
MLA 姚建可,et al."Effects of deposition rates on laser damage threshold of TiO2/SiO2 high reflectors".appl. surf. sci. 255.9(2009):4733.
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