Influence of ZrO<inf>2</inf> in HfO<inf>2</inf> on reflectance of HfO<inf>2</inf>/SiO<inf>2</inf> multilayer at 248 nm prepared by electron-beam evaporation

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 光学薄膜技术研究与发展中心

	Influence of ZrO2 in HfO2 on reflectance of HfO2/SiO2 multilayer at 248 nm prepared by electron-beam evaporation
	Yuan Jingmei ; Yuan Lei ; He HB(贺洪波) ; Yi Kui ; Fan ZX(范正修) ; Shao JD(邵建达)
刊名	appl. surf. sci.
	2008
卷号	254 期号:15 页码:4864
关键词	HfO2/SiO2 multilayer ZrO2 impurity reflectance
ISSN号	0169-4332
中文摘要	influence of zro2 in hfo2 on the reflectance of hfo2/sio2 multilayer at 248 nm was investigated. two kinds of hfo2 with different zro2 content were chosen as high refractive index material and the same kind of sio2 as low refractive index material to prepare the mirrors by electron-beam evaporation. the impurities in two kinds of hfo2 starting coating materials and in their corresponding single layer thin films were determined through glow discharge mass spectrum (gdms) technology and secondary ion mass spectrometry (sims) equipment, respectively. it showed that between the two kinds of hfo2, either the bulk materials or their corresponding films, the difference of zro2 was much larger than that of the other impurities such as ti and fe. it is the zr element that affects the property of thin films. both in theoretical and in experimental, the mirror prepared with the hfo2 starting material containing more zr content has a lower reflectance. because the extinction coefficient of zirconia is relatively high in uv region, it can be treated as one kind of absorbing defects to influence the optical property of the mirrors. (c) 2008 elsevier b.v. all rights reserved.
学科主题	光学薄膜
收录类别	EI
语种	英语
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4756]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Yuan Jingmei,Yuan Lei,He HB,et al. Influence of ZrO2 in HfO2 on reflectance of HfO2/SiO2 multilayer at 248 nm prepared by electron-beam evaporation[J]. appl. surf. sci.,2008,254(15):4864, 4867.
APA	Yuan Jingmei,Yuan Lei,贺洪波,Yi Kui,范正修,&邵建达.(2008).Influence of ZrO2 in HfO2 on reflectance of HfO2/SiO2 multilayer at 248 nm prepared by electron-beam evaporation.appl. surf. sci.,254(15),4864.
MLA	Yuan Jingmei,et al."Influence of ZrO2 in HfO2 on reflectance of HfO2/SiO2 multilayer at 248 nm prepared by electron-beam evaporation".appl. surf. sci. 254.15(2008):4864.