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	Positional detection in grating mosaic based on image processing of far-field diffraction intensity patterns in two wavelengths
	Hu, Y. ; Zeng, L.J.
	2010-10-12 ; 2010-10-12
关键词	Practical/ diffraction gratings image segmentation/ grating mosaic image processing far-field diffraction intensity patterns meter-size diffraction grating positional detection sensitivity/ B6135 Optical, image and video signal processing C5260B Computer vision and image processing techniques
中文摘要	As an alternative for producing the meter-size diffraction grating demanded in many technical field, grating mosaic requires positional detection with accuracy of sub-microns. In this paper, we propose a positional detection method based on image processing of three far-field diffraction intensity patterns in two wavelengths. With a set of detailed adjustment steps deduced from theoretical analysis, we successfully detected and separated the two positional errors. Moreover, with the three patterns we enlarged the target range of coarse adjustment required for further fine adjustment in longitudinal position. We achieved positional detection sensitivity of less than 14 nm, and diagnosed the alignment with the far-field pattern in a third wavelength.
语种	英语
出版者	Trans Tech Publications Ltd. ; Switzerland
内容类型	期刊论文
源URL	[http://hdl.handle.net/123456789/80359]
专题	清华大学
推荐引用方式 GB/T 7714	Hu, Y.,Zeng, L.J.. Positional detection in grating mosaic based on image processing of far-field diffraction intensity patterns in two wavelengths[J],2010, 2010.
APA	Hu, Y.,&Zeng, L.J..(2010).Positional detection in grating mosaic based on image processing of far-field diffraction intensity patterns in two wavelengths..
MLA	Hu, Y.,et al."Positional detection in grating mosaic based on image processing of far-field diffraction intensity patterns in two wavelengths".(2010).

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