Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 光学薄膜技术研究与发展中心

	Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector
	Yuan Lei ; Zhao Yuanan ; Shang Guangqiang ; Wang Chengren ; He HB(贺洪波) ; Shao JD(邵建达) ; Fan ZX(范正修)
刊名	j. opt. soc. am. b-opt. phys.
	2007
卷号	24 期号:3 页码:538
关键词	Electron beams Hafnium compounds Laser beam effects Morphology Reflective coatings Ultrashort pulses
ISSN号	0740-3224
中文摘要	hfo2 single layers, 800 run high-reflective (hr) coating, and 1064 ran hr coating were prepared by electron-beam evaporation. the laser-induced damage thresholds (lidts) and damage morphologies of these samples were investigated with single-pulse femtosecond and nanosecond lasers. it is found that the lidt of the hfo2 single layer is higher than the hfo2-sio2 hr coating in the femtosecond regime, while the situation is opposite in the nanosecond regime. different damage mechanisms are applied to study this phenomenon. damage morphologies of all samples due to different laser irradiations are displayed. (c) 2007 optical society of america.
学科主题	光学薄膜
收录类别	EI
语种	英语
WOS记录号	WOS:000244587900016
公开日期	2009-09-22
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/4526]
专题	上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式 GB/T 7714	Yuan Lei,Zhao Yuanan,Shang Guangqiang,et al. Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector[J]. j. opt. soc. am. b-opt. phys.,2007,24(3):538, 543.
APA	Yuan Lei.,Zhao Yuanan.,Shang Guangqiang.,Wang Chengren.,贺洪波.,...&范正修.(2007).Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector.j. opt. soc. am. b-opt. phys.,24(3),538.
MLA	Yuan Lei,et al."Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector".j. opt. soc. am. b-opt. phys. 24.3(2007):538.