HfO2薄膜的结构对抗激光损伤阈值的影响; Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold
高卫东 ; 张伟丽 ; 范树海 ; 张大伟 ; 邵建达 ; 范正修
刊名光子学报
2005
卷号34期号:2页码:176
关键词 HfO_2 Film 氧化铪 Laser-induced damage threshold 薄膜 激光损伤阈值
ISSN号1004-4213
其他题名Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold
中文摘要利用蒸发氧化铪和离子辅助蒸发金属铪反应沉积氧化铪薄膜,对两种工艺下制备的氧化铪薄膜进行光学和结构以及激光损伤特性的研究,实验结果表明,用金属铪反应沉积的氧化铪薄膜不仅结构均匀,并且具有较高的激光损伤阈值.文章对损伤阈值和薄膜的结构及光学特性之间的关系进行了讨论。; HfO 2 films have been deposited with electron beam evaporation of HfO 2 and ion assisted electron beam evaporation of Hf. Optical and structural properties and laser induce damage threshold of the films have been studied; it was found that HfO 2 film deposited with electron beam evaporation of Hf with ion assisted technology shows uniform structural properties and higher laser induced damage threshold. The relation between structural and damage threshold of HfO 2 films has also been studied.
学科主题光学薄膜
分类号TN24
收录类别ei
语种中文
公开日期2009-09-22 ; 2010-10-12
内容类型期刊论文
源URL[http://ir.siom.ac.cn/handle/181231/4398]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
高卫东,张伟丽,范树海,等. HfO2薄膜的结构对抗激光损伤阈值的影响, Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold[J]. 光子学报,2005,34(2):176, 179.
APA 高卫东,张伟丽,范树海,张大伟,邵建达,&范正修.(2005).HfO2薄膜的结构对抗激光损伤阈值的影响.光子学报,34(2),176.
MLA 高卫东,et al."HfO2薄膜的结构对抗激光损伤阈值的影响".光子学报 34.2(2005):176.
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