Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films | |
Hong RJ(洪瑞金) ; Qi HJ(齐红基) ; Huang JB ; He GB ; Fan ZX(范正修) ; Shao JD(邵建达) | |
刊名 | thin solid films
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2005 | |
卷号 | 473期号:1页码:58 |
关键词 | zinc oxide sputtering liminescence optical properties |
ISSN号 | 0040-6090 |
中文摘要 | the effects of oxygen partial pressure on the structure and photoluminescence (pl) of zno films were studied. the films were prepared by direct current (dc) reactive magnetron sputtering with various oxygen concentrations at room temperature. with increasing oxygen ratio, the structure of films changes from zinc and zinc oxide phases, single-phase zno, to the (002) orientation, and the mechanical stresses exhibit from tensile stress to compressive stress. films deposited at higher oxygen pressure show weaker emission intensities, which may result from the decrease of the oxygen vacancies and zinc interstitials in the film. this indicates that the emission in zno film originates from the oxygen vacancy and zinc interstitial-related defects. from optical transmittance spectra of zno films, the plasma edge shifts towards the shorter wavelength with the improvement of film stoichiometry. (c) 2004 elsevier b.v. all rights reserved. |
学科主题 | 光学薄膜 |
收录类别 | EI |
语种 | 英语 |
WOS记录号 | WOS:000225749000010 |
公开日期 | 2009-09-22 |
内容类型 | 期刊论文 |
源URL | [http://ir.siom.ac.cn/handle/181231/4360] ![]() |
专题 | 上海光学精密机械研究所_光学薄膜技术研究与发展中心 |
推荐引用方式 GB/T 7714 | Hong RJ,Qi HJ,Huang JB,et al. Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films[J]. thin solid films,2005,473(1):58, 62. |
APA | 洪瑞金,齐红基,Huang JB,He GB,范正修,&邵建达.(2005).Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films.thin solid films,473(1),58. |
MLA | 洪瑞金,et al."Influence of oxygen partial pressure on the structure and photoluminescence of direct current reactive magnetron sputtering ZnO thin films".thin solid films 473.1(2005):58. |
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