| Zr过渡层对Al膜微结构与性能的影响 | |
| 李冬梅 ; 王旭波 ; 潘峰 ; 牛洁斌 ; 刘明 ; LI Dong-mei ; WANG Xu-bo ; PAN Feng ; NIU Hao-bin ; LIU Ming | |
| 2010-06-10 ; 2010-06-10 | |
| 关键词 | Al膜 Zr过渡层 附着力 电阻 Al thin films Zr underlayer adhesion resistivity TN65 |
| 其他题名 | The Effects of Zr Underlayer on the Microstructure and Properties of Al Films |
| 中文摘要 | 为了增加高频声表面波器件用Al薄膜的功率承受力以及与基体的附着力,同时不增加薄膜在化学反应刻蚀中的难度,并精确地控制图形的尺寸,采用电子束蒸镀法研究了Zr过渡层和薄膜固化工艺对Al膜微结构、形貌、电性能及机械性能的影响。结果表明,适当厚度(5～30nm)的Zr过渡层增强了Al膜的(111)织构,增加了薄膜与LiNbO3基体的结合力,200°C固化后电阻率明显降低。拥有Zr过渡层的Al膜具有良好的工艺性能,通过反应离子刻蚀易获得精确的换能器图形。; In order to improve the the power durability and adhesion of Al films in high-frequency surface acoustic wave(SAW)devices,and to obtain fine-dimensional control and etching pattern in dry etching process,Al films with Zr underlayer were evaporated in electro beam evaporation system.The effects of Zr underlayer and harden techniques of the films on microstructure,morphology,electronic properties and mechanical properties were investigated.The results show that the texture of Al films and their adhesion to substrates are largely improved when the thickness of Zr underlayer is between 5 and 30 nm.The resistivity of Al films also decreases after annealing treatment at 200 癈.The Al electrodes with Zr underlayer can be easily formed in reactive ion etching process.; 国家高技术"八六三"计划资助项目(2002AA325040); 教育部重大科技资助项目(0303) |
| 语种 | 中文 ; 中文 |
| 内容类型 | 期刊论文 |
| 源URL | [http://hdl.handle.net/123456789/61203]  |
| 专题 | 清华大学 |
| 推荐引用方式 GB/T 7714 | 李冬梅,王旭波,潘峰,等. Zr过渡层对Al膜微结构与性能的影响[J],2010, 2010. |
| APA | 李冬梅.,王旭波.,潘峰.,牛洁斌.,刘明.,...&LIU Ming.(2010).Zr过渡层对Al膜微结构与性能的影响.. |
| MLA | 李冬梅,et al."Zr过渡层对Al膜微结构与性能的影响".(2010). |
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