测量薄膜微粗糙度的总积分散射仪; Total integrated scatterometer for measuring the microroughness of optical thin films
侯海虹 ; 洪瑞金 ; 张东平 ; 易葵 ; 范正修 ; 邵建达
刊名中国激光
2005
卷号32期号:9页码:1258
关键词测量 measurement 表面粗糙度 surface roughness 标量散射 scalar scattering 散射仪 scatterometer
ISSN号0258-7025
其他题名Total integrated scatterometer for measuring the microroughness of optical thin films
中文摘要介绍了一种检测光学薄膜表面总积分散射(TIS)分布的总积分散射仪。对仪器的基本结构、理论基础、测量原理以及系统性能等进行了阐述,提出了抑制系统噪音和提高测量精度的有效措施。利用该仪器对K9基底上的银(Ag)膜和氧化锆(ZrO2)薄膜进行了测量,并根据标量散射理论得到了表面均方根(RMS)粗糙度。利用光学轮廓仪和原子力显微镜(AFM)分别测量了上述Ag膜和ZrO2薄膜的表面均方根粗糙度,并与总积分散射仪所得的粗糙度进行了比较。结果表明,根据测量的薄膜表面总积分散射计算得到的表面均方根粗糙度与光学轮廓仪及原子; In this paper, an instrument for detecting the distribution of the surface total integrated scattering (TIS) of the optical thin films is introduced. The apparatus structure, theoretic foundation, measuring principle, and the system performance of the instrument are described. Effective means are adopted to control the noise and to improve the measuring accuracy of the system. Silver (Ag) layers and zirconia (ZrO2) films deposited on K9 glasses are measured by this instrument, then using the scalar scattering method, the root mean square (RMS) roughness of these films are calculated. Optical profilometer and atomic force microscopy (AFM) are used to obtain the surface RMS roughness of Ag layers and ZrO2 films, respectively, which are compared with the roughness obtained by the scattering instrument. It is shown that the surface RMS roughness of the optical films calculated in terms of the TIS measurements agrees well with that obtained by optical profilometer and AFM measurement, and the difference is within 0.01~0.13 nm.
学科主题光学薄膜
分类号TH744.3
收录类别ei
语种中文
公开日期2009-09-22
内容类型期刊论文
源URL[http://ir.siom.ac.cn/handle/181231/4220]  
专题上海光学精密机械研究所_光学薄膜技术研究与发展中心
推荐引用方式
GB/T 7714
侯海虹,洪瑞金,张东平,等. 测量薄膜微粗糙度的总积分散射仪, Total integrated scatterometer for measuring the microroughness of optical thin films[J]. 中国激光,2005,32(9):1258, 1261.
APA 侯海虹,洪瑞金,张东平,易葵,范正修,&邵建达.(2005).测量薄膜微粗糙度的总积分散射仪.中国激光,32(9),1258.
MLA 侯海虹,et al."测量薄膜微粗糙度的总积分散射仪".中国激光 32.9(2005):1258.
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