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	CVD-SiC反射镜制备过程中热应力变形的研究
	陈道勇 ; 张剑寒 ; 张宇民 ; Chen Daoyong ; Zhang Jianhan ; Zhang Yumin
	2010-06-08 ; 2010-06-08
关键词	碳化硅 反射镜 有限元 热应力 热变形 SiC,Mirror,Finite element,Thermal stress,Thermal displacement V250.2
其他题名	Thermal Stress and Displacement in Process of Producing CVD-SiC Mirror
中文摘要	采用CVD工艺在反应烧结碳化硅(RB-SiC)反射镜坯体上沉积了一层致密的碳化硅薄膜作为反射镜镜面。CVD-SiC和RB-SiC热物理性能上的差异引起的热残余应力和热变形,在很大程度上影响反射镜的质量,本文采用有限单元法计算了沉积过程中反射镜的温度场、应力场和热变形,采用X射线衍射方法测试了薄膜表面的残余应力。分析结果表明,薄膜存在较大的残余应力,包括热应力和本征应力,两者量值相当,热变形很小。; The compact SiC film was deposited on the reaction bonded silicon carbon(RB-SiC)mirror by chemical vapor deposition(CVD)process.Because of the difference of thermo-physical properties between CVD-SiC and RB-SiC,thermal residual stress and thermal displacement appeared.This would affect the quality of the mirror to a large extent.In this paper,temperature field,stress field and thermal displacement of the mirror were analyzed by finite element method in the course of deposition process.The residual stress of the CVD-SiC film surface was tested by X-ray diffraction method.Results show there is a larger residual stress in the film.Residual stress is comprised of thermal stress and essential stress,and their magnitude is equivalent.Thermal displacement of mirror surface is small.
语种	中文 ; 中文
内容类型	期刊论文
源URL	[http://hdl.handle.net/123456789/48179]
专题	清华大学
推荐引用方式 GB/T 7714	陈道勇,张剑寒,张宇民,等. CVD-SiC反射镜制备过程中热应力变形的研究[J],2010, 2010.
APA	陈道勇,张剑寒,张宇民,Chen Daoyong,Zhang Jianhan,&Zhang Yumin.(2010).CVD-SiC反射镜制备过程中热应力变形的研究..
MLA	陈道勇,et al."CVD-SiC反射镜制备过程中热应力变形的研究".(2010).

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