Structural and optical properties of a-plane ZnO thin films synthesized on γ-LiAlO2 (302) substrates by low pressure metal-organic chemical vapor deposition
Lin Hui ; Zhou SM(周圣明) ; Zhou Jianhua ; Liu Xuedong ; Gu Shulin ; Zhu Shunming ; Xie Zili ; Han Ping ; Zhang Rong
刊名thin solid films
2008
卷号516期号:18页码:6079
关键词a-plane ZnO thin films structural and optical properties gamma-LiAlO2 (302) substrates metal organic chemical vapor deposition X-ray diffraction atomic force miscroscopy Raman spectroscopy
ISSN号0040-6090
中文摘要nonpolar a-plane (1120) zno thin films have been fabricated on gamma-lialo2 (302) substrates via the low-pressure metal-organic chemical vapor deposition. an obvious intensity variation of the e-2 mode in the raman spectra indicates that there exhibits in-plane optical anisotropy in the a-plane zno thin films. highly-oriented uniform grains of rectangular shape can be seen from the atomic force microscopy images, which mean that the lateral growth rate of the thin films is also anisotropic. it is demonstrated experimentally that a buffer layer deposited at a low temperature (200 degrees c) can improve the structural and optical properties of the epilayer to a large extent. (c) 2007 elsevier b.v. all rights reserved.
学科主题光学材料;晶体
收录类别EI
语种英语
公开日期2009-09-24
内容类型期刊论文
源URL[http://ir.siom.ac.cn/handle/181231/6145]  
专题上海光学精密机械研究所_激光与光电子功能材料研发中心
推荐引用方式
GB/T 7714
Lin Hui,Zhou SM,Zhou Jianhua,et al. Structural and optical properties of a-plane ZnO thin films synthesized on γ-LiAlO2 (302) substrates by low pressure metal-organic chemical vapor deposition[J]. thin solid films,2008,516(18):6079, 6082.
APA Lin Hui.,周圣明.,Zhou Jianhua.,Liu Xuedong.,Gu Shulin.,...&Zhang Rong.(2008).Structural and optical properties of a-plane ZnO thin films synthesized on γ-LiAlO2 (302) substrates by low pressure metal-organic chemical vapor deposition.thin solid films,516(18),6079.
MLA Lin Hui,et al."Structural and optical properties of a-plane ZnO thin films synthesized on γ-LiAlO2 (302) substrates by low pressure metal-organic chemical vapor deposition".thin solid films 516.18(2008):6079.
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