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	In situ endpoint detection of reactive ion-beam etching of dielectric gratings with an etch-stop layer using downstream mass spectrometry
	Meng, Xiangfeng ; Li, Lifeng
	2010-05-10 ; 2010-05-10
关键词	endpoint detection reactive ion-beam etching dielectric gratings mass spectrometry REFLECTION GRATINGS DESIGN SIO2 Chemistry, Physical Materials Science, Coatings & Films Physics, Applied Physics, Condensed Matter
中文摘要	Downstream mass spectrometry is successfully used in the reactive ion-beam etching of dielectric diffraction gratings of deep grooves with vertical sidewalls to achieve in situ endpoint detection. Silica (SiO2) gratings with a Sc2O3 etch-stop layer are fabricated by reactive ion-beam etching with CHF3 as etchant, and the mass spectrometric signal of SiF3+ produced by the reactive etching of the SiO2 grating material is monitored. When the etch-stop layer is reached, a drop of this signal occurs. By comparing the monitoring curves and resulting gratings of different etching methods, we find that the decrease of the monitored signal is strongly influenced by the sidewall steepness of the etched grating grooves. All conditions being equal, the greater sidewall steepness renders the faster decrease of the signal. Consequently, the proposed approach of endpoint detection applies well to the gratings with steep sidewalls. With the help of two previously developed methods, the sidewall steepness of grating grooves is increased, and the optimal endpoint is detected. Employing the proposed technique, we have reproducibly fabricated dielectric gratings with proper groove depth and even groove bottom. (c) 2008 Elsevier B.V. All rights reserved.
语种	英语 ; 英语
出版者	ELSEVIER SCIENCE BV ; AMSTERDAM ; PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
内容类型	期刊论文
源URL	[http://hdl.handle.net/123456789/24849]
专题	清华大学
推荐引用方式 GB/T 7714	Meng, Xiangfeng,Li, Lifeng. In situ endpoint detection of reactive ion-beam etching of dielectric gratings with an etch-stop layer using downstream mass spectrometry[J],2010, 2010.
APA	Meng, Xiangfeng,&Li, Lifeng.(2010).In situ endpoint detection of reactive ion-beam etching of dielectric gratings with an etch-stop layer using downstream mass spectrometry..
MLA	Meng, Xiangfeng,et al."In situ endpoint detection of reactive ion-beam etching of dielectric gratings with an etch-stop layer using downstream mass spectrometry".(2010).

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