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In-situ self-monitoring of latent image in fabrication of holographic gratings
Zhao Jinsong ; Li Lifeng ; Wu Zhenhua
2010-05-10 ; 2010-05-10
关键词Practical Experimental New Development/ holographic gratings laser beams light diffraction light interference optical fabrication photographic process photoresists refractive index Talbot effect/ in-situ latent image self-monitoring technique holographic grating fabrication interference pattern coherent laser beams refractive index photoresist layer self-diffracted orders detection optimal exposure dose simulated modeling curves phenomenological exposure model diffractive optical component physical optics/ A4240E Holographic optical elements holographic gratings A4285D Optical fabrication, surface grinding A4260H Laser beam characteristics and interactions A4230 Optical information, image formation and analysis B4350 Holography B4330 Laser beam interactions and properties B6135 Optical, image and video signal processing
中文摘要A novel technique of monitoring the exposure process in fabrication of holographic gratings is presented. When exposed to the interference pattern of two coherent laser beams, the refractive index of the photoresist layer undergoes a time-dependent, spatially periodic change, leading to a latent-image grating that in turn diffracts the two incident recording beams. By detecting one of the self-diffracted orders, without introducing an additional monitoring laser beam, one can obtain a monitoring curve whose features convey valuable information about the exposure process. This technique, termed in-situ self-monitoring technique, can be used to sensitively and objectively detect the variations in the optimal exposure dose caused by random differences of properties from sample to sample, so that compensative measures can be taken by the operator as the exposure is still in progress. A complete monitoring curve is divided into four characteristic zones and the significance of each zone is discussed. It is found that it is the shape rather than the scale of the monitoring curve that determines when the exposure dose is optimal. Authors' simulated modeling curves resulted from adopting a phenomenological exposure model are found to be in good agreement with the experimental monitoring curves. This in-situ self-monitoring technique is a simple and efficient tool for selecting optimal exposures in fabrication of holographic gratings.
语种中文 ; 中文
出版者Science Press ; China
内容类型期刊论文
源URL[http://hdl.handle.net/123456789/24433]  
专题清华大学
推荐引用方式
GB/T 7714
Zhao Jinsong,Li Lifeng,Wu Zhenhua. In-situ self-monitoring of latent image in fabrication of holographic gratings[J],2010, 2010.
APA Zhao Jinsong,Li Lifeng,&Wu Zhenhua.(2010).In-situ self-monitoring of latent image in fabrication of holographic gratings..
MLA Zhao Jinsong,et al."In-situ self-monitoring of latent image in fabrication of holographic gratings".(2010).
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