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	Nanoindentation studies of Cu-W alloy films prepared by magnetron sputtering
	Zong, R. L. ; Wen, S. P. ; Zeng, F. ; Gao, Y. ; Pan, F.
	2010-05-10 ; 2010-05-10
关键词	Cu-W system amorphous nanoindentation mechanical properties BULK METALLIC GLASSES PLASTIC-DEFORMATION SERRATED FLOW THIN-FILMS TEMPERATURE BEHAVIOR ZR Chemistry, Physical Materials Science, Multidisciplinary Metallurgy & Metallurgical Engineering
中文摘要	Cu-W alloy films were prepared by magnetron sputtering. Their microstructure, hardness, elastic modulus and plastic deformation were investigated by various technologies. The results show that Cu-W amorphous alloy films are formed in the composition range from Cu36W64 to Cu75W25, and out of this range solid solutions are formed. Both the hardness and elastic modulus of Cu-W amorphous alloy films are lower than their rule-of-mixture values. The load-displacement curves of Cu-W amorphous alloys with lower Cu content exhibit obvious serrated flow at lower strain rate. Serrations are suppressed at higher strain rate and higher Cu content. For all Cu-W amorphous alloy films, shear bands are observed and their number and density increase with increasing Cu content. indicating that the details of the plastic deformation of Cu-W amorphous alloys arc material-related. (C) 2007 Elsevier B.V. All rights reserved.
语种	英语 ; 英语
出版者	ELSEVIER SCIENCE SA ; LAUSANNE ; PO BOX 564, 1001 LAUSANNE, SWITZERLAND
内容类型	期刊论文
源URL	[http://hdl.handle.net/123456789/20849]
专题	清华大学
推荐引用方式 GB/T 7714	Zong, R. L.,Wen, S. P.,Zeng, F.,et al. Nanoindentation studies of Cu-W alloy films prepared by magnetron sputtering[J],2010, 2010.
APA	Zong, R. L.,Wen, S. P.,Zeng, F.,Gao, Y.,&Pan, F..(2010).Nanoindentation studies of Cu-W alloy films prepared by magnetron sputtering..
MLA	Zong, R. L.,et al."Nanoindentation studies of Cu-W alloy films prepared by magnetron sputtering".(2010).

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