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	Influence of deposition processing conditions on polycrystalline silicon thin film for solar cells on ceramic substrates
	Li, HF ; Huang, Y ; Wan, ZJ ; Zhang, HX ; Xu, Y
	2010-05-10 ; 2010-05-10
会议名称	PRICM 5: THE FIFTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-5 ; 5th Pacific Rim International Conference on Advanced Materials and Processing ; Beijing, PEOPLES R CHINA ; Web of Science
关键词	deposition processing poly silicon film RTCVD AL2O3 Materials Science, Multidisciplinary
中文摘要	Various polycrystalline silicon thin films were deposited on Al2O3 ceramic substrates by RTCVD processing under different deposition conditions. The influence of deposition conditions on thin film quality was studied and a set of typical processing parameters were obtained, which would direct the RTCVD processing of thin film silicon solar cell technique.
会议录出版者	TRANS TECH PUBLICATIONS LTD ; ZURICH-UETIKON ; BRANDRAIN 6, CH-8707 ZURICH-UETIKON, SWITZERLAND
语种	英语 ; 英语
内容类型	会议论文
源URL	[http://hdl.handle.net/123456789/19965]
专题	清华大学
推荐引用方式 GB/T 7714	Li, HF,Huang, Y,Wan, ZJ,et al. Influence of deposition processing conditions on polycrystalline silicon thin film for solar cells on ceramic substrates[C]. 见:PRICM 5: THE FIFTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-5, 5th Pacific Rim International Conference on Advanced Materials and Processing, Beijing, PEOPLES R CHINA, Web of Science.

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