Fabrication of SiCN MEMS by UV lithography of polysilazane | |
Wang, Huatao ; Xie, Zhipeng ; Yang, Weiyou ; Liu, Guoquan ; An, Linan | |
2010-05-10 ; 2010-05-10 ; OCT 23-26, 2005 | |
会议名称 | High-Performance Ceramics IV, Pts 1-3 ; 4th China International Conference on High-Performance Ceramics (CICC-4) ; Chengdu, PEOPLES R CHINA ; Web of Science |
关键词 | SiCN MEMS polysilazane UV lithography photo initiator CERAMIC MEMS POLYMER Materials Science, Ceramics Materials Science, Composites |
中文摘要 | A novel process with low cost to fabricate SiCN MEMS based on UV lithographic technique is present in this paper. The prepared MEMS are very promising to be used in high-temperature environments. By adding a photo initiator to the polysilazane precursor, the precursor becomes UV-sensitive and can be solidified upon exposure to UV light, which leads to the formation of UV photo lithographical patterns. Key issues of the fabrication process are investigated and various SiCN MEMS structures are fabricated by this technique. |
会议录出版者 | TRANS TECH PUBLICATIONS LTD ; STAFA-ZURICH ; LAUBLSRUTISTR 24, CH-8717 STAFA-ZURICH, SWITZERLAND |
语种 | 英语 ; 英语 |
内容类型 | 会议论文 |
源URL | [http://hdl.handle.net/123456789/17974] ![]() |
专题 | 清华大学 |
推荐引用方式 GB/T 7714 | Wang, Huatao,Xie, Zhipeng,Yang, Weiyou,et al. Fabrication of SiCN MEMS by UV lithography of polysilazane[C]. 见:High-Performance Ceramics IV, Pts 1-3, 4th China International Conference on High-Performance Ceramics (CICC-4), Chengdu, PEOPLES R CHINA, Web of Science. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论