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	Fabrication of SiCN MEMS by UV lithography of polysilazane
	Wang, Huatao ; Xie, Zhipeng ; Yang, Weiyou ; Liu, Guoquan ; An, Linan
	2010-05-10 ; 2010-05-10 ; OCT 23-26, 2005
会议名称	High-Performance Ceramics IV, Pts 1-3 ; 4th China International Conference on High-Performance Ceramics (CICC-4) ; Chengdu, PEOPLES R CHINA ; Web of Science
关键词	SiCN MEMS polysilazane UV lithography photo initiator CERAMIC MEMS POLYMER Materials Science, Ceramics Materials Science, Composites
中文摘要	A novel process with low cost to fabricate SiCN MEMS based on UV lithographic technique is present in this paper. The prepared MEMS are very promising to be used in high-temperature environments. By adding a photo initiator to the polysilazane precursor, the precursor becomes UV-sensitive and can be solidified upon exposure to UV light, which leads to the formation of UV photo lithographical patterns. Key issues of the fabrication process are investigated and various SiCN MEMS structures are fabricated by this technique.
会议录出版者	TRANS TECH PUBLICATIONS LTD ; STAFA-ZURICH ; LAUBLSRUTISTR 24, CH-8717 STAFA-ZURICH, SWITZERLAND
语种	英语 ; 英语
内容类型	会议论文
源URL	[http://hdl.handle.net/123456789/17974]
专题	清华大学
推荐引用方式 GB/T 7714	Wang, Huatao,Xie, Zhipeng,Yang, Weiyou,et al. Fabrication of SiCN MEMS by UV lithography of polysilazane[C]. 见:High-Performance Ceramics IV, Pts 1-3, 4th China International Conference on High-Performance Ceramics (CICC-4), Chengdu, PEOPLES R CHINA, Web of Science.

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