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	Deposition and characterization of AlN thin films on silicon
	Yu Yi ; Ren Tianling ; Liu Litian
	2010-05-07 ; 2010-05-07
关键词	Experimental/ aluminium compounds Auger electron spectra crystal orientation crystallites III-V semiconductors semiconductor thin films sputter deposition texture wide band gap semiconductors X-ray diffraction/ aluminum nitride thin films MEMS devices DC magnetron reactive sputtering X-ray diffraction Auger electron spectroscopy crystalline orientation growth mechanism crystallites preferred orientation FWHM curve AlN Si Al-Si Pt-Ti-Si/ A8115C Deposition by sputtering A6855 Thin film growth, structure, and epitaxy A6160 Crystal structure of specific inorganic compounds A6480G Microstructure A6150J Crystal morphology and orientation A8280P Electron spectroscopy for chemical analysis (photoelectron, Auger spectroscopy, etc.) A8140E Cold working, work hardening post-deformation annealing, recovery and recrystallisation textures B0520B Sputter deposition B2520D II-VI and III-V semiconductors/ AlN/bin Al/bin N/bin Si/sur Si/el AlSi/sur Al/sur Si/sur AlSi/ss Al/ss Si/ss PtTiSi/sur Pt/sur Si/sur Ti/sur PtTiSi/ss Pt/ss Si/ss Ti/ss
中文摘要	Aluminum nitride (AlN) thin films for MEMS devices have been successfully deposited on Si(100), Al/Si(100) and Pt/Ti/Si(100) by DC magnetron reactive sputtering. X-ray diffraction (XRD) and Auger electron spectroscopy (AES) are used to analyzed crystalline orientation and components of the films. The influence of different processing parameters of the film preferential orientation is investigated. The growth mechanism of AlN crystallites on different substrates is also discussed. These films show a excellent preferred orientation of <002> with a rocking curve FWHM of 5.6 degrees.
语种	中文 ; 中文
出版者	Science Press ; China
内容类型	期刊论文
源URL	[http://hdl.handle.net/123456789/16644]
专题	清华大学
推荐引用方式 GB/T 7714	Yu Yi,Ren Tianling,Liu Litian. Deposition and characterization of AlN thin films on silicon[J],2010, 2010.
APA	Yu Yi,Ren Tianling,&Liu Litian.(2010).Deposition and characterization of AlN thin films on silicon..
MLA	Yu Yi,et al."Deposition and characterization of AlN thin films on silicon".(2010).

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