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Structure design of amorphous silicon thin film transistor used as uncooled infrared sensors
Liu Xing-Ming ; Han Lin ; Liu Li-tian
2010-05-07 ; 2010-05-07
关键词structure optimization uncooled a-Si TFT infrared sensors detectivity thermal design SI Instruments & Instrumentation Optics Physics, Applied
中文摘要The influence of gate dimensions on the detectivity of uncooled amorphous silicon thin film transistor infrared sensors is analyzed theoretically. The relationship between the structure parameter of thin film transistor and electronic as well as thermal responsivity is simulated by finite element analysis software. Optimized structure has been carried out through theoretical analysis and ANSYS 8.0 simulation. (c) 2006 Elsevier B.V. All rights reserved.
语种英语 ; 英语
出版者ELSEVIER SCIENCE BV ; AMSTERDAM ; PO BOX 211, 1000 AE AMSTERDAM, NETHERLANDS
内容类型期刊论文
源URL[http://hdl.handle.net/123456789/16543]  
专题清华大学
推荐引用方式
GB/T 7714
Liu Xing-Ming,Han Lin,Liu Li-tian. Structure design of amorphous silicon thin film transistor used as uncooled infrared sensors[J],2010, 2010.
APA Liu Xing-Ming,Han Lin,&Liu Li-tian.(2010).Structure design of amorphous silicon thin film transistor used as uncooled infrared sensors..
MLA Liu Xing-Ming,et al."Structure design of amorphous silicon thin film transistor used as uncooled infrared sensors".(2010).
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