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Analysis and design of an accelerometer fabricated with porous silicon as sacrificial layer
Zhou Jun ; Wang Xiaohong ; Yao Pengjun ; Dong Liang ; Liu Litian
2010-05-07 ; 2010-05-07
关键词Practical Experimental/ accelerometers crystal microstructure elemental semiconductors microsensors piezoresistive devices porous semiconductors semiconductor epitaxial layers silicon sputter etching/ piezoresistive silicon accelerometer fabrication porous silicon etching epitaxial layer MEMS movable microstructures TMAH solution additional Si powder Si/ A0630G Velocity, acceleration and rotation measurement A0710C Micromechanical devices and systems B7320E Velocity, acceleration and rotation measurement B2550E Surface treatment (semiconductor technology) B2575F Fabrication of micromechanical devices B0580 Powders and porous materials (engineering materials science) B7230M Microsensors/ Si/int Si/el
中文摘要A piezoresistive silicon accelerometer fabricated by a selective, self-stopping porous silicon (PS) etching method using an epitaxial layer for movable microstructures is described and analyzed. The technique is capable of constructing a microstructure precisely. PS is used as a sacrificial layer, and releasing holes are etched in the film. TMAH solution with additional Si powder and (NH/sub 4/)/sub 2/S/sub 2/O/sub 8/ is used to remove PS through the small releasing holes without eroding uncovered Al. The designed fabrication process is full compatible with standard CMOS process.
语种英语 ; 英语
出版者Science Press ; China
内容类型期刊论文
源URL[http://hdl.handle.net/123456789/16392]  
专题清华大学
推荐引用方式
GB/T 7714
Zhou Jun,Wang Xiaohong,Yao Pengjun,et al. Analysis and design of an accelerometer fabricated with porous silicon as sacrificial layer[J],2010, 2010.
APA Zhou Jun,Wang Xiaohong,Yao Pengjun,Dong Liang,&Liu Litian.(2010).Analysis and design of an accelerometer fabricated with porous silicon as sacrificial layer..
MLA Zhou Jun,et al."Analysis and design of an accelerometer fabricated with porous silicon as sacrificial layer".(2010).
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