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A method for describing and monitoring process states in IC fabrication
Ju Li-jie ; Yan Li-ren
2010-05-07 ; 2010-05-07
关键词Practical/ integrated circuit manufacture process monitoring/ process state monitoring integrated circuit fabrication process state space PCM parameters process failures data distribution statistical process control/ B0170G General fabrication techniques B0170E Production facilities and engineering
中文摘要One way to construct a process state space is to compose a set of generalized parameters from orthogonalizing the PCM parameters, and use them as the bases of the space. With our method, not only the possible process failures can be detected, but also the process state can be long term monitored. In the process state space, the data distribution appears like a multi-dimension elliptical globe. So, the transition of a process can be monitored by tracing the transmutations of the elliptical globe. A formula is suggested to calculate the process state similarity. Further, if a process failure occurs, the cause can be directly pointed out.
语种中文 ; 中文
出版者Editorial Dept. Microelectronics ; China
内容类型期刊论文
源URL[http://hdl.handle.net/123456789/16371]  
专题清华大学
推荐引用方式
GB/T 7714
Ju Li-jie,Yan Li-ren. A method for describing and monitoring process states in IC fabrication[J],2010, 2010.
APA Ju Li-jie,&Yan Li-ren.(2010).A method for describing and monitoring process states in IC fabrication..
MLA Ju Li-jie,et al."A method for describing and monitoring process states in IC fabrication".(2010).
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