| Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 degrees C | |
| Qian Wan ; Xinde Bai ; Xiayong Liu | |
| 2010-05-06 ; 2010-05-06 | |
| 关键词 | Experimental/ ion implantation noncrystalline structure oxidation radiation effects zirconium alloys/ air oxidation zircaloy-4 nitrogen ion implantation weight gain microstructure irradiation damage amorphous phase 500 degC/ A8160B Surface treatment and degradation of metals and alloys A6170T Doping and implantation of impurities A6180J Ion beam effects/ temperature 7.73E+02 K/ Zr/ss |
| 中文摘要 | The oxidation property of zircaloy-4 samples was significantly changed by nitrogen ion implantation. With an increase of the implantation dose, the weight gain increases first and then deceases quickly. Microstructure analysis of the implanted samples showed that the oxidation behavior at lower dose might be mainly influenced by irradiation damage, while improvement of the oxidation behavior at higher dose could be attributed to the formation of amorphous phase on the sample surface. |
| 语种 | 英语 ; 英语 |
| 出版者 | Kluwer Academic Publishers ; USA |
| 内容类型 | 期刊论文 |
| 源URL | [http://hdl.handle.net/123456789/11146]  |
| 专题 | 清华大学 |
| 推荐引用方式 GB/T 7714 | Qian Wan,Xinde Bai,Xiayong Liu. Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 degrees C[J],2010, 2010. |
| APA | Qian Wan,Xinde Bai,&Xiayong Liu.(2010).Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 degrees C.. |
| MLA | Qian Wan,et al."Air oxidation behavior of nitrogen ion implanted zircaloy-4 at 500 degrees C".(2010). |
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