Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates | |
Xu Zhang ; Zhi Liu ; Chao He ; Buwen Cheng ; Chunlai Xue ; Chuanbo Li ; Qiming Wang | |
刊名 | journal of materials science: materials in electronics |
2016 | |
卷号 | 27期号:9页码:9341-9345 |
学科主题 | 光电子学 |
收录类别 | SCI |
公开日期 | 2017-03-16 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/27983] |
专题 | 半导体研究所_光电子研究发展中心 |
推荐引用方式 GB/T 7714 | Xu Zhang,Zhi Liu,Chao He,et al. Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates[J]. journal of materials science: materials in electronics,2016,27(9):9341-9345. |
APA | Xu Zhang.,Zhi Liu.,Chao He.,Buwen Cheng.,Chunlai Xue.,...&Qiming Wang.(2016).Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates.journal of materials science: materials in electronics,27(9),9341-9345. |
MLA | Xu Zhang,et al."Characterization and thermal stability of GeSn/Ge multi-quantum wells on Ge (100) substrates".journal of materials science: materials in electronics 27.9(2016):9341-9345. |
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