Predicting multilayer film's residual stress from its monolayers

CORC > 金属研究所 > 中国科学院金属研究所

	Predicting multilayer film's residual stress from its monolayers
	Guo, CQ ; Pei, ZL ; Fan, D ; Liu, RD ; Gong, J ; Sun, C
刊名	MATERIALS & DESIGN
	2016-11-15
卷号	110 页码:858-864
关键词	Residual stress Multilayer film Diamond-like carbon CrN/DLC multilayer Cathodic vacuum arc
ISSN号	0264-1275
通讯作者	Pei, ZL ; Sun, C (reprint author), Chinese Acad Sci, Inst Met Res, Shenyang 110016, Peoples R China.
学科主题	Materials Science, Multidisciplinary
收录类别	SCI
资助信息	National Key Basic Research Program of China (973 Program) [2012CB625100]; Natural Science Foundation of Liaoning Province of China [2013020093]
语种	英语
公开日期	2016-12-28
内容类型	期刊论文
源URL	[http://ir.imr.ac.cn/handle/321006/76181]
专题	金属研究所_中国科学院金属研究所
推荐引用方式 GB/T 7714	Guo, CQ,Pei, ZL,Fan, D,et al. Predicting multilayer film's residual stress from its monolayers[J]. MATERIALS & DESIGN,2016,110:858-864.
APA	Guo, CQ,Pei, ZL,Fan, D,Liu, RD,Gong, J,&Sun, C.(2016).Predicting multilayer film's residual stress from its monolayers.MATERIALS & DESIGN,110,858-864.
MLA	Guo, CQ,et al."Predicting multilayer film's residual stress from its monolayers".MATERIALS & DESIGN 110(2016):858-864.