Laser-induced damage resistance of AlF3 films
Sun, Jian; Li, Xu; Zhang, Weili; Yi, Kui; Shao, Jianda
2013
会议名称conference on pacific rim laser damage - optical materials for high power lasers
通讯作者sun, j (reprint author), chinese acad sci, shanghai inst opt & fine mech, key lab mat high power laser, shanghai 201800, peoples r china.
英文摘要alf3 thin films were prepared by thermal evaporation at different substrate temperatures and deposition rates. the relationships between optical properties, mechanical properties and laser-induced damage threshold (lidt) at 355nm of alf3 films were discussed. both absorption and stress increased with increasing substrate temperatures and deposition rates, which was a disadvantage to laser-induced damage resistance. meanwhile, interfacial adhesion and hardness increased with substrate temperatures and deposition rates, which was an advantage to enhance the lidt. the lidt increased from room temperature to 200 degrees c duo to increasing interfacial adhesion and hardness, and then decreased to 300 degrees c duo to increasing absorption and stress. the lidt decreased with deposition rates due to increasing absorption and stress.
收录类别CPCI
会议录pacific rim laser damage 2013: optical materials for high power lasers
会议录出版者spie-int soc optical engineering
语种英语
内容类型会议论文
源URL[http://ir.siom.ac.cn/handle/181231/17035]  
专题上海光学精密机械研究所_中科院强激光材料重点实验室
作者单位1.[Sun, Jian
2.Li, Xu
3.Zhang, Weili
4.Yi, Kui
5.Shao, Jianda] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
推荐引用方式
GB/T 7714
Sun, Jian,Li, Xu,Zhang, Weili,et al. Laser-induced damage resistance of AlF3 films[C]. 见:conference on pacific rim laser damage - optical materials for high power lasers.
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace