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题名	高性能氧化铪薄膜的研究
作者	刘丰
学位类别	硕士
答辩日期	2010
授予单位	中国科学院上海光学精密机械研究所
导师	张伟丽
关键词	氧化铪薄膜 光学性能 激光损伤阈值 电子束沉积 离子束技术
其他题名	Research of high performance hafnium oxide thin films
中文摘要	氧化铪薄膜是应用最广泛的高功率激光薄膜，本文着重研究了氧化铪薄膜的制备技术和以及不同的制备技术对薄膜的结构和热力学性能的影响，为提高氧化铪薄膜性能奠定了基础。 本文首先研究了电子束蒸发沉积氧化铪薄膜的工艺，重点研究了沉积速率对薄膜光学性能、结构和激光损伤阈值的影响。同时研究了电子束反应蒸发沉积氧化铪薄膜技术中沉积速率和氧分压对薄膜折射率、表面形貌和激光损伤阈值的影响，并从理论上加以分析，结合实验结果得出电子束蒸发制备高性能薄膜的工艺参数。 对于离子束辅助电子束蒸发沉积技术，本文主要研究了全离子束过程对氧化铪薄膜性能的影响，分析了影响薄膜性能的有利因素和不利因素，找到如何进一步提高薄膜性能的实验方向。研究了离子束后处理中离子束能量对薄膜性能的影响，结果显示利用离子束后处理可以进一步改善薄膜性能。 对影响宽带减反膜损伤阈值的杂质进行了初步的理论分析，对常见的几种杂质产生的温升进行比较。分析了单层膜的折射率、消光系数和膜层厚度对宽带减反膜光谱性能的影响，为实际的薄膜光学器件的制备提供了理论依据。
英文摘要	Hafnium oxide (HfO2) films are the most used films in high power laser field. We study the preparation technologies of HfO2 films and the influences of different preparation technology on structural and thermal properties of the HfO2 films, which is the basis of improving the performance of HfO2 films. This paper studies the techniques of electron beam evaporation HfO2 films, especially the influences of deposition rate on the characteristics of thin films such as the optical property, film structure and laser induced damage threshold. Also the effects of deposition rate and oxygen partial pressure on refractive index, surface topography and laser induced damage threshold of HfO2 films deposited by electron beam reactive deposition from hafnium were investigated. According to the experimental results we obtain the optimal electron beam evaporation process parameters of high-performance thin films. The influences of all ion beam process on the characteristics of HfO2 films prepared by the ion beam assisted electron beam evaporation technique were analyzed. It is found that the ion beam assisted electron beam evaporation is the competitive process of favorable and unfavorable factors on the performance of deposited coatings. .Further studies of the ion beam treatment on the deposited films were carried out; the results show that after the use of ion beam processing the properties of the films can be improved. The impacts of impurities on the damage threshold of thin films were theoretical analyzed. At the same time the temperature rise aroused by the impurities in the coatings was compared. The influences of refractive index, extinction coefficient and film thickness of single film on the optical spectrum characteristics of anti-reflection films were investigated, which provides theoretical basis for the high power laser multilayer films.
语种	中文
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/16676]
专题	上海光学精密机械研究所_学位论文
推荐引用方式 GB/T 7714	刘丰. 高性能氧化铪薄膜的研究[D]. 中国科学院上海光学精密机械研究所. 2010.

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