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题名	无掩模激光直写纳米光刻机
作者	范永涛
学位类别	博士
答辩日期	2009
授予单位	中国科学院上海光学精密机械研究所
导师	徐文东
关键词	激光直写 无掩模光刻 微纳加工 自动聚焦 功率标定
其他题名	Maskless Nanometer Laser direct Writer for Lithography
中文摘要	自 21世纪以来，由半导体微电子技术引发的微型化革命进入了一个新的时代，这就是“纳米技术”时代。微纳米技术依赖于微纳米尺度的功能结构与器件，实现功能结构微纳米化的基础是先进的微纳米加工技术。激光直写光刻技术作为一种先进的微纳加工制作技术，在许多高新技术领域有着重要的应用，国际上发达国家的激光直写工艺水平发展迅速，且有部分已经产品化，应用于实验研究和工业生产中，但国内的激光直写技术和工艺水平与国外相差巨大，远不能满足国家高技术领域的实际需求，急需开展激光直写光刻系统和相关材料、原理和工艺的研究。 开发一套高精度的激光直写系统，用于研究掩模超分辨光刻及其它纳米材料，把可见光波段的激光直写光刻应用到纳米光学制造领域，并形成核心技术的自主知识产权，为中国的半导体制造及微纳加工领域提供一种低成本、高性能的技术手段，这就本论文的意义所在。设计和搭建激光直写纳米光刻机是本论文的主体。 本论文首先简要介绍了光刻技术的发展历程，具体阐述了有掩模光刻中的投影光刻、纳米压印光刻和无掩模光刻中的电子束直写光刻、空间光调制光刻、激光束直写光刻的基本原理及主要特点。其中激光束直写光刻由于具有低成本、低环境要求、高性能等众多优点而得到广泛发展及应用。另外分别介绍了国内外激光直写系统的几种典型结构，并对其主要特点和参数进行了说明，为自行开发激光直写系统提供参考。 针对采用激光直写系统来研究新型掩模超分辨纳米光刻和其它纳米材料这个具体需求，对整个系统提出高性能、多功能、实验性平台三方面要求，并以此为基础，设计系统结构，对构成系统的刻写激光调制模块、聚焦伺服模块、样品扫描模块的关键器件进行选型。 在完成刻写系统的结构设计和关键器件选型后，对系统进行集成和优化。系统的整体软硬件控制架构对系统性能、开发难度影响较大，需要首先加以确定。对专用控制器结构和以计算机为核心的“虚拟仪器”结构进行对比分析后发现，虚拟仪器结构开发环境友好、开发周期短、灵活性大，而其时间确定性低、硬件反馈速度低的缺点在刻写速度慢的情况下影响不大，所以最终被采纳。之后，对影响系统性能的自动聚焦控制、刻写激光功率标定及校正、刻写路径生成、刻写样品检测等几个问题进行了详细讨论，采用这些措施后，系统成为一个功能强大、使用方便的通用型纳米材料研究平台。 激光直写系统的实际性能是需要用实验来具体检验的。在文章的实验部分，首先对系统的单元功能进行测试及评价，如系统的自动聚焦精度、刻写激光脉冲精度、刻写点位置精度以及样品反射率透过率检测精度等，之后在系统上进行了材料研究实验，如掩模超分辨光刻材料、光存储材料、灰度掩模材料实验等。实验结果表明，本激光直写系统的性能参数达到了预期设计。
英文摘要	Since 21 century，the revolution caused by semiconductor micro-electronic technologies come into a new era，which named as “Nanometer Era”. Micro-nano technology depends on the functional structures and elements at micro-nano scale，the basement of realization functional structures is advanced micro-nano fabrication technology. As an advanced machining technology，laser direct writer (LDW) for lithography has great applications in many high-tech areas. LDW technology in developed countries grows quickly，parts of the products already commercial，applied in scientific studies and industrial productions. However，the domestic developments of LDW are far behind the international levels，and couldn’t meet the national high-tech needs. Therefore，it is necessary to study the development of LDW system and relevant materials、mechanisms and techniques. This dissertation focused on the development of a high-accurate laser direct writing system，which could applied to study super-RENS mask material and other nano-materials. Laser direct writing in visible light was employed in nano-optics fabrication areas，we expect to form our own intellectual property rights，and supply a low-cost，high powered technologies for Chinese semi-conductor and micro-nano fabrication areas. The main parts of this dissertation are designing and constructing laser direct writing system. The development of lithography technology is reviewed in this paper. The basic principles and main features of lithography with mask including projection lithography and nano-imprint lithography, and the lithography without mask including direct-write electron-beam lithography and spatial light modulator lithography, laser-beam direct-write lithography are briefly explained. The laser-beam direct-write lithography is widely used and developed due to its low cost, low environmental requirements, high performance and other features. Besides, the main features and parameters of several typical LDW structures in China and other countries are discussed respectively, providing an important reference for independently developing LDW. Laser Direct Writer (LDW) for lithography is widely developed and applied because of its low-cost, low environmental requirements, and many other advantages of high-performance. Several typical structures of LDW at home and abroad are introduced with main characteristics and parameters, which provides references for the self-development. Considering the research purposes of LDW is to study the new super-resolution materials for lithography and other specific nano-materials, the writer must be constructed with three main characters: high performance, multifunctional and experimental platform. The writer is designed with the characters and is consisted of three modules: writing laser modulation module, servo focus module and sample scanning module. Upon completion of the designation of the LDW structure, the main task is to integrate and optimize the system. Considering the hardware and software architecture seriously affect the developing difficulty and system’s performance, the software and hardware architecture needs to be identified at first. Compared with dedicated instrument structure, the virtual instrument structure based on computer has several advantages, such as the much more friend development environment, shorter development cycles, and greater flexibility. The shortage of virtual instrument structure as long uncertain time and low hardware feedback speed has little impact to the system when the writing speed is slow, and the virtual instrument structure is be adopted in the end. The auto-focus control, writing-laser power calibration and correction, writing path generation, and samples detection, which have great impact on system performance, are discussed in detail, and then the system becomes a powerful, easy-to-use platform for nano-materials research. The actual performance of the LDW must be checkout by experiments. In the last part of this paper, the basic functions of the system, such as the auto-focus accuracy, writing laser pulse precision, location accuracy of written spot, and precision of reflectivity and transmittance, are tested and evaluated. Materials study based on the LDW, such like super-resolution lithography mask materials, optical storage materials, gray-scale mask, is shown in detail. The experimental results show that the performance of the system achieves the desired design parameters.
语种	中文
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/15555]
专题	上海光学精密机械研究所_学位论文
推荐引用方式 GB/T 7714	范永涛. 无掩模激光直写纳米光刻机[D]. 中国科学院上海光学精密机械研究所. 2009.

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