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题名	离子束溅射薄膜的光学和位相特性研究
作者	黄建兵
学位类别	博士
答辩日期	2005
授予单位	中国科学院上海光学精密机械研究所
导师	邵建达
关键词	离子束溅射 相位延迟膜 波长分离膜 单层膜 损伤阈值 面型 误差 表面吸附层和界面层
其他题名	The investigation on the optical and phase performance of coatings by ion-beam sputter
中文摘要	本文围绕强激光系统用高闭值薄膜和相位延迟膜以及其它光学系统用光学性能要求高的薄膜展开研究。通过调节真空气氛的分布和离子能量，发现离子束溅射沉积的单层膜的折射率接近甚至超过块体材料的折射率，研究发现膜料的纯度高和镀膜过程中化学计量比保持得很好是获得在红外波段高闭值TaZos、SidZ单层膜的重要条件。通过工艺的改进，制备了低吸收的HfOZ单层膜，但是经研究发现Hf靶材中的有害杂质Fe等含量过高是导致红外波段闭值较低的主要原因。此外，研究还发现用于红外波段的5102材料在紫外波段吸收较大是降低该波段薄膜损伤阑值的重要原因。利用离子束溅射技术的污染少、吸收低的特性，制备出吸收仅为gppm、闭值高达129．5）／cmZ（lo64nm，12ns）的非晶态高反膜和闭值为24．6）／cmZ的减反膜。当光斜入射时，研究发现P分量表面场强高，是P分量闭值比S分量低的根本原因，另外还发现非工作面的膜层情况、基底材料以及表面清洁状况都是影响P分量阂值的重要条件。此外，研究还发现通过改变非工作面的膜层厚度，修正了由于离子束能量过大造成的工作面的面型变化。设计了金属加介质和全介质的外反射式相位延迟膜及全内反射式相位延迟膜，研究了相移偏差与膜层的物理厚度、折射率、入射角、相移带宽、相移值和样韶l的退火等的关系。发现折射率或物理厚度变化1％，相移的变化在7．50到12．50之间：鼓外层厚度变化1％会造成相移变化5．50；入射角变化lo，相移会变化2．50；随着入射角的增大、相移带宽的减小和相移值的增大，相移的偏井增人。通过严格控制制备工艺条件获得了仅与设计值相差2．5"的相位延迟膜。此外，研究还发现Ag是址适合做含金属层的相位延迟膜的金属材料；层优化方式适合设计个内反射式相位延迟膜。最后，根据表而吸附层和界而层理论，研究发现制备误差和表面吸附是产生相移偏差的主要原因。利用离子束溅射稳定性高的特性，制备出用于空间探测、神光III、嫦娥工程、全固态激光系统用的多种高性能薄膜，如宽截止滤光片、高消光比偏振膜、宽带增透膜、短波通膜以及波长分离膜等，并在相应的工作中发挥了重要的作用。
英文摘要	For the purpose of improving the optical properties of coatings, high damage-resistant laser coatings and phase retarders for high intensity laser system, and a series of high performance coatings for other optical system were studied in this paper. By controlling distribution of reactive gas and ion energy, we prepared coatings whose refractive indices are near to, even higher than that of corresponding bulk material. High purity material and good stoichimetric proportion films have been found to be the important factors for the high laser-induced damage threshold (LIDT) of Ta2Oj and SiC>2 monolayer. By improving the preparing process, the low absorption HfO? monolayer was gained, but it was found that high content of Fe in the Hf target resulted in the low LIDT of HfC^ films in ultraviolet range. In addition, the silicon dioxide material, which was used for infrared range, has high absorption in ultraviolet range as the result that the LIDT of silica films was rather low. Because ion beam sputtering is free impurity and weak absorption, a amorphous minor with low absorption of 9ppm, as high LIDT as 129.5J/cirT (1064nm, 12ns) and antirefleetion (AR) coating with high LIDT 24.6J/cm2 ( 1064nm, 12ns) were obtained by this technology. When light was oblique incidence, high surface electric field intensity of p-polari/c resulted in lower LIDT than that of s-polarize. On the other hand, status of back surface coating, substrate material and contamination of coating played very important roles in affecting the LIDT of p-polarize. Then, changing thickness of (he back surface coatings could correct incident plane's profile variation resulting from high ion beam energy bombardment. Three types of phase reUirder, including metal and dielectric, all dielectric and totally reflecting phase retarder. were designed and prepared. The relation between phase shil'l deviation and layer thickness, refractive index, incident angle, phase shift bandwidth, phase shift and annealing temperature were discussed. Il was found that 1% physical thickness or refractive index changes would pose phase shift changes in the range from 7.5-degrce to 12.5-degrce, phase shift would changes by 5.5-degree with variation of 1% the outmost layer thickness, and 2.5-degree with variation of a degree incident angle. Then, phase shift deviation increasing with the increasing of the incident angle and phase shift, and the decreasing of the phase shift bandwidth. By strict process controlling, phase retarder with only 2.5-degree difference between the sample and the design was deposited. Furthermore, it has been found that silver is more suitable for studying metal and dielectric phase retarder, compared with the group optimization, the layer optimization is suitable for the totally reflecting phase retarder. Finally, according to the theoretical analysis of surface adhesion and interface layer, we found that both preparation error and surface absorption played chief roles in the phase shift deviation. With high stability , ion beam sputtering has been used to prepared some kinds of high performance coatings for space detection, SHENGUANG III laser system, CHANG'E project, all solid-state laser system, such as broad stopband filter, high extinction ratio polarizer, broadband AR coating, shortwave pass filter and beam splitter etc, which played very important roles in corresponding system.
语种	中文
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/15501]
专题	上海光学精密机械研究所_学位论文
推荐引用方式 GB/T 7714	黄建兵. 离子束溅射薄膜的光学和位相特性研究[D]. 中国科学院上海光学精密机械研究所. 2005.

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