Read-only memory disk with AgOx and AgInSbTe superresolution mask layer

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 高密度光存储技术实验室

	Read-only memory disk with AgOx and AgInSbTe superresolution mask layer
	Zhang F ; Wang Y ; Xu WD(徐文东) ; Gan FX(干福熹)
刊名	opt. eng.
	2005
卷号	44 期号:6 页码:65202
关键词	optical storage superresolution near-field structure read-only memory disk AgOx AgInSbTe mask layer
ISSN号	0091-3286
中文摘要	two novel read-only memory (rom) disks, one with an agox mask layer and the other with an aginsbte mask layer, are proposed and studied. the agox and the aginsbte films sputtered on the premastered substrates with pit depths of 50 nm and pit lengths (space) of 380 nm are studied by atomic force microscopy. disk readout measurement is carried out using a dynamic setup with a laser wavelength of 632.8 nm and an object lens numerical aperture (na) of 0.40. results show that the superresolution effect happens only at a suitable oxygen flow ratio for the agox rom disk. the best superresolution readout effect is achieved at an oxygen flow ratio of 0.5 with the smoothest film surface. compared with the agox rom disk, the aginsbte rom disk has a much smoother film surface and better superresolution effect. a carrier-to-noise ratio (cnr) of above 40 db can be obtained at an appropriate readout power and readout velocity. the readout cnr of both the agox and aginsbte rom disks have a nonlinear dependence on the readout power. the superresolution readout mechanisms for these rom disks are analyzed and compared as well. (c) 2005 society of photo-optical instrumentation engineers.
学科主题	光存储
收录类别	EI
语种	英语
公开日期	2009-09-22 ; 2010-10-12
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/3841]
专题	上海光学精密机械研究所_高密度光存储技术实验室
推荐引用方式 GB/T 7714	Zhang F,Wang Y,Xu WD,et al. Read-only memory disk with AgOx and AgInSbTe superresolution mask layer[J]. opt. eng.,2005,44(6):65202.
APA	Zhang F,Wang Y,徐文东,&干福熹.(2005).Read-only memory disk with AgOx and AgInSbTe superresolution mask layer.opt. eng.,44(6),65202.
MLA	Zhang F,et al."Read-only memory disk with AgOx and AgInSbTe superresolution mask layer".opt. eng. 44.6(2005):65202.