投影物镜偏振像差对光刻成像质量影响的解析分析方法

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 信息光学与光电技术实验室

	投影物镜偏振像差对光刻成像质量影响的解析分析方法
	沈丽娜 ; 李思坤 ; 王向朝 ; 闫观勇
刊名	光学学报
	2015
卷号	35 期号:6 页码:611003
其他题名	Analytical Analysis Method for Impact of Polarization Aberration of Projection Lens on Lithographic Imaging Quality
通讯作者	Shen Lina, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. ; Li Sikun, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. ; Wang Xiangzhao, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China. ; Yan Guanyong, Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China.
中文摘要	提出一种分析线性偏振照明条件下投影物镜偏振像差对交替相移掩模(Alt-PSM)空间像影响的解析方法。基于矢量光刻成像理论,从掩模空间像的光强分布推导出偏振像差引起的空间像图形位置偏移误差(IPE)和最佳焦面偏移(BFS)的解析表达式,实现了各个泡利-泽尼克偏振像差对空间像影响的解析分析。建立了IPE与奇像差项泡利-泽尼克系数和BFS与偶像差项泡利-泽尼克系数间的线性关系。通过光刻仿真软件模拟验证了解析分析结果的正确性,并用最小二乘法评估了线性关系的精确度。
英文摘要	An analytical analysis method for the impact of polarization aberration of projection lens on aerial image of alternating phase-shift mask (Alt-PSM) is proposed. Analytical expressions of image placement error (IPE) and best focus shift (BFS) caused by polarization aberration are derived. Analytical analysis for effect of every Pauli-Zernike polarization aberration to aerial image is realized. The linear relationships between IPE and odd items of Pauli-Zernike polarization aberrations, as well as that between BFS and even items of Pauli-Zernike polarization aberrations are established. The validity of analytical results is verified by numerical simulations, and the accuracy of linear relationships is assessed by the least square method.
收录类别	EI
原文出处	http://www.opticsjournal.net
语种	中文
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/14170]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
作者单位	1.沈丽娜, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. 2.李思坤, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. 3.王向朝, 中国科学院上海光学精密机械研究所, 上海 201800, 中国. 4.闫观勇, 中国科学院上海光学精密机械研究所, 上海 201800, 中国.
推荐引用方式 GB/T 7714	沈丽娜,李思坤,王向朝,等. 投影物镜偏振像差对光刻成像质量影响的解析分析方法[J]. 光学学报,2015,35(6):611003.
APA	沈丽娜,李思坤,王向朝,&闫观勇.(2015).投影物镜偏振像差对光刻成像质量影响的解析分析方法.光学学报,35(6),611003.
MLA	沈丽娜,et al."投影物镜偏振像差对光刻成像质量影响的解析分析方法".光学学报 35.6(2015):611003.