Direct Laser Writing Facility for Fabrication of Submicron Mask

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 信息光学与光电技术实验室

	Direct Laser Writing Facility for Fabrication of Submicron Mask
	Zhu F(朱锋); Ma JY(麻健勇)
刊名	chin. phys. lett.
	2014
卷号	31 期号:4 页码:48102
关键词	DIFFRACTIVE OPTICAL-ELEMENTS RAPID FABRICATION CONTINUOUS-RELIEF LITHOGRAPHY SYSTEM GLASS
通讯作者	ma, jy (reprint author), chinese acad sci, shanghai inst opt & fine mech, informat opt lab, shanghai 201800, peoples r china.
英文摘要	direct laser writing technique has become a well-established, multi-functional and flexible method for fabricating high quality diffractive optical elements. we propose and build a maskless direct laser writing system with the ability to produce a sub-micron feature size. the high precision lithography is realized by using the astigmatic autofocus method. the minimum feature size of the system, breaking through the diffraction limit with the chromium layer, can achieve 300 nm with the 405 nm blue laser. a 50 x 50 mm(2) chromium grating mask with a period of 1 mu m and line width of 300 nm is fabricated. this facility will be useful for the fabrication of large-scale submicron diffraction optical elements in the future.
收录类别	SCI
语种	英语
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/13088]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
作者单位	1.[Zhu Feng 2.Ma Jian-Yong] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Informat Opt Lab, Shanghai 201800, Peoples R China
推荐引用方式 GB/T 7714	Zhu F,Ma JY. Direct Laser Writing Facility for Fabrication of Submicron Mask[J]. chin. phys. lett.,2014,31(4):48102.
APA	朱锋,&麻健勇.(2014).Direct Laser Writing Facility for Fabrication of Submicron Mask.chin. phys. lett.,31(4),48102.
MLA	朱锋,et al."Direct Laser Writing Facility for Fabrication of Submicron Mask".chin. phys. lett. 31.4(2014):48102.