Threshold of femtosecond laser-induced damage in transparent materials | |
Jia, TQ; Li, RX; Liu, Z; Xu, ZZ | |
刊名 | appl. phys. a-mater. sci. process.
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2002 | |
卷号 | 74期号:4页码:503 |
通讯作者 | jia, tq (reprint author), chinese acad sci, shanghai inst opt & fine mech, lab high intens opt, pob 800-211, shanghai 201800, peoples r china. |
英文摘要 | the rate at which conduction-band electrons (cbe) absorb laser energy is calculated by both the quantum mechanical and the classical methods. here fused silica irradiated with a 780-nm femtosecond-pulse laser is used as an example. it is found that the rate obtained by the quantum mechanical method is about one-third of that by the classical method, and it is much less than the direct-current limit. in the flux-doubling model, the avalanche rate in fused silica is 4 i ps(-1) obtained by the quantum mechanical method, while it is about 13.7 ips(-1) by the classical method, where the laser intensity i is in units of twcm(-2). the differential equation of the evolution of cbe density is solved numerically, and it is found that the combination of cbe hole recombination, cbe diffusion and initial cbe density (< 10(13) cm(-3)) is not important. the dependence of avalanche breakdown threshold on laser-pulse duration is presented. the threshold calculated by the quantum mechanical method agrees well with experimental results, while the threshold obtained by the classical method differs greatly from the experiments. |
收录类别 | SCI |
语种 | 英语 |
WOS记录号 | WOS:000174673300009 |
内容类型 | 期刊论文 |
版本 | 出版稿 |
源URL | [http://ir.siom.ac.cn/handle/181231/17733] ![]() |
专题 | 上海光学精密机械研究所_强场激光物理国家重点实验室 |
作者单位 | Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Lab High Intens Opt, Shanghai 201800, Peoples R China |
推荐引用方式 GB/T 7714 | Jia, TQ,Li, RX,Liu, Z,et al. Threshold of femtosecond laser-induced damage in transparent materials[J]. appl. phys. a-mater. sci. process.,2002,74(4):503. |
APA | Jia, TQ,Li, RX,Liu, Z,&Xu, ZZ.(2002).Threshold of femtosecond laser-induced damage in transparent materials.appl. phys. a-mater. sci. process.,74(4),503. |
MLA | Jia, TQ,et al."Threshold of femtosecond laser-induced damage in transparent materials".appl. phys. a-mater. sci. process. 74.4(2002):503. |
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