Self-diffraction and optical limiting properties of organically modified sol-gel material containing palladium-octaisopentyloxy-phthalocyanine under cw laser illumination

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 高密度光存储技术实验室

	Self-diffraction and optical limiting properties of organically modified sol-gel material containing palladium-octaisopentyloxy-phthalocyanine under cw laser illumination
	Gu, YZ ; Liang, ZJ ; Gan, FX
刊名	opt. mater.
	2001
卷号	17 期号:4 页码:471
通讯作者	gu, yz (reprint author), chinese acad sci, shanghai inst opt & fine mech, pob 800-211, shanghai 201800, peoples r china.
英文摘要	palladium-octaisopentyloxy-phthalocyanine-doped organically modified silicate (ormosil) has been prepared. significant optical multiple diffraction rings of the sample under cw ar+ laser illumination at wavelengths of 457.9, 488.0 and 514.5 nm were observed. correspondingly, the sample exhibited flexible optical limiting properties when a size-changeable aperture was used. 457.9 nm has the best limiting effect among the three wavelengths. (c) 2001 elsevier science b.v. all rights reserved.
收录类别	SCI
语种	英语
WOS记录号	WOS:000170591200004
内容类型	期刊论文
版本	出版稿
源URL	[http://ir.siom.ac.cn/handle/181231/17324]
专题	上海光学精密机械研究所_高密度光存储技术实验室
作者单位	1.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China 2.Henan Univ, Dept Phys, Kaifeng 475001, Peoples R China
推荐引用方式 GB/T 7714	Gu, YZ,Liang, ZJ,Gan, FX. Self-diffraction and optical limiting properties of organically modified sol-gel material containing palladium-octaisopentyloxy-phthalocyanine under cw laser illumination[J]. opt. mater.,2001,17(4):471.
APA	Gu, YZ,Liang, ZJ,&Gan, FX.(2001).Self-diffraction and optical limiting properties of organically modified sol-gel material containing palladium-octaisopentyloxy-phthalocyanine under cw laser illumination.opt. mater.,17(4),471.
MLA	Gu, YZ,et al."Self-diffraction and optical limiting properties of organically modified sol-gel material containing palladium-octaisopentyloxy-phthalocyanine under cw laser illumination".opt. mater. 17.4(2001):471.