Influence of distribution of optical component surface defects on near field beam quality

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 高功率激光物理国家实验室

	Influence of distribution of optical component surface defects on near field beam quality
	You Kewei ; Zhang Yanli ; Zhang Xuejie ; Zhang Junyong ; Zhu Jianqiang
	2015
会议名称	20th international symposium on high power laser systems and applications (hpls and a)
通讯作者	you, kw (reprint author), chinese acad sci, shanghai inst opt & fine mech, shanghai 201800, peoples r china.
英文摘要	international standard iso 10110-7 sets a strict limit on the size and quantity for surface defects of an optical element. for high-power laser, sub-beams caused by defects with different distributions interfere with each other in the transmission process, causing beam quality complex changes. so it is necessary to make a clear limitation on relative position of defects, thereby giving the standard a more comprehensive supplement. based on the diffraction theory, the changes of beam modulation are studied. the influence of scratch depth on the distribution of near field beam modulation is also taken into account. results demonstrate that when two parallel scratches are on the same or different surfaces of an element, they produce more severe modulation than single scratch, and the maximum modulation can be increased to 1.5 times. meanwhile more strict requirements for scratch depth are put forward. the results could provide reference for the determination of defects specifications for large-diameter optical elements in high-power laser systems.
收录类别	CPCI
会议录	proc.spie
会议录出版者	spie-int soc optical engineering
语种	英语
内容类型	会议论文
源URL	[http://ir.siom.ac.cn/handle/181231/17172]
专题	上海光学精密机械研究所_高功率激光物理国家实验室
作者单位	1.[You Kewei 2.Zhang Yanli 3.Zhang Xuejie 4.Zhang Junyong 5.Zhu Jianqiang] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
推荐引用方式 GB/T 7714	You Kewei,Zhang Yanli,Zhang Xuejie,et al. Influence of distribution of optical component surface defects on near field beam quality[C]. 见:20th international symposium on high power laser systems and applications (hpls and a).