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	Methods of eliminating the grid effect based on DMD technique of maskless lithography
	Yanli Li; Wei Yan; Jian Wang; Yong Yang; Lixin Zhao
	2010
会议名称	Proceedings of the SPIE - The International Society for Optical Engineering
会议日期	2010
卷号	7657
页码	765716 (7 pp.)
通讯作者	Yanli Li
中文摘要	The three novel methods of eliminating the grid effect caused by space duty cycle of Digital Micromirror Device (DMD) based on the DMD technique of maskless lithography are proposed, which are limiting the numerical aperture of projection objective, utilizing diffractive optical element arrays and using phase controlled beam shaping elements arrays. The physical mechanism of the grid effect is studied. The principles of three methods are analyzed and the experimental project about limiting the numerical aperture of projection objective, diffractive optical element arrays and phase controlled beam shaping elements arrays are proposed. The experimental results are given and the similarities and differences of the three methods are compared and analyzed. The experimental results indicate that these three methods can clear up the grid effect caused by space duty cycle of DMD. The research results will provide the references for improving the quality of maskless lithography device.
英文摘要	The three novel methods of eliminating the grid effect caused by space duty cycle of Digital Micromirror Device (DMD) based on the DMD technique of maskless lithography are proposed, which are limiting the numerical aperture of projection objective, utilizing diffractive optical element arrays and using phase controlled beam shaping elements arrays. The physical mechanism of the grid effect is studied. The principles of three methods are analyzed and the experimental project about limiting the numerical aperture of projection objective, diffractive optical element arrays and phase controlled beam shaping elements arrays are proposed. The experimental results are given and the similarities and differences of the three methods are compared and analyzed. The experimental results indicate that these three methods can clear up the grid effect caused by space duty cycle of DMD. The research results will provide the references for improving the quality of maskless lithography device.
收录类别	EI ; ISTP
语种	英语
内容类型	会议论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7638]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	中国科学院光电技术研究所
推荐引用方式 GB/T 7714	Yanli Li,Wei Yan,Jian Wang,et al. Methods of eliminating the grid effect based on DMD technique of maskless lithography[C]. 见:Proceedings of the SPIE - The International Society for Optical Engineering. 2010.

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