Effects and improvements of coating induced polarization aberration on lithography lens design

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所 > 中科院长春光机所知识产出

	Effects and improvements of coating induced polarization aberration on lithography lens design
	Shang, H.; C. Liu; W. Zhang and H. n. Chen
刊名	Guangxue Xuebao/Acta Optica Sinica
	2015
卷号	35 期号:1
英文摘要	In order to achieve high imaging requirement of projection lithography lens, the impact of polarization effects induced by coatings need to be considered and analyzed during the design process. Polarization aberration theory based on the Jones matrix is first described, then the polarization aberration of a numerical aperture (NA) of 0.75 projection lithography lens with corresponding coating is analyzed as an example. The large power and spherical aberrations induced by the coating are compensated with space and focus optimization. The scalar aberration and point spread function distortion are improved from 68.92 nm and 3.76 nm to 1.08 nm and 0.38 nm, respectively. The contrast of 90 nm dense line also increases from 0.082 to 0.876. Based on this, a method to reduce polarization aberration introduced by coating is represented, such as retardation and diattenuation. Combined films are used to control the magnitude and phase separation of the P and S component simultaneously. With this method, the contrast of the 90nm dense line is improved by 1.1%. , 2015, Chinese Optical Society. All right reserved.
收录类别	EI
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/56186]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Shang, H.,C. Liu,W. Zhang and H. n. Chen. Effects and improvements of coating induced polarization aberration on lithography lens design[J]. Guangxue Xuebao/Acta Optica Sinica,2015,35(1).
APA	Shang, H.,C. Liu,&W. Zhang and H. n. Chen.(2015).Effects and improvements of coating induced polarization aberration on lithography lens design.Guangxue Xuebao/Acta Optica Sinica,35(1).
MLA	Shang, H.,et al."Effects and improvements of coating induced polarization aberration on lithography lens design".Guangxue Xuebao/Acta Optica Sinica 35.1(2015).