Concept and modeling analysis of a high fidelity multimode deformable mirror

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	Concept and modeling analysis of a high fidelity multimode deformable mirror
	Zhou, Chao; Li, Yun; Wang, Anding; Xing, Tingwen
刊名	APPLIED OPTICS
	2015
卷号	54 期号:17 页码:5436-5443
ISSN号	1559-128X
中文摘要	Conventional deformable mirrors (DM) cannot meet the requirement of aberration controlling for advanced lithography tools. This paper illustrates an approach using the property that deformation of a thin plate is similar to optical modes to realize a high fidelity multimode deformable mirror whose deformation has characteristics of optical aberration modes. The way to arrange actuators is also examined. In this paper, a 36-actuator deformable mirror is taken as an example to generate low-order Zernike modes. The result shows that this DM generates the fourth fringe Zernike mode (Z4) defocus, and primary aberration Z5-Z8 with an error less than 0.5%, generates the fifth-order aberration Z10-Z14, and generates the seventh-order aberration Z17-Z20 with an error less than 1.1%. The high fidelity replication of the Zernike mode indicates that the DM satisfies the demand of controlling aberrations corresponding to the first 20 Zernike modes in an advanced lithography tool. (C) 2015 Optical Society of America
英文摘要	Conventional deformable mirrors (DM) cannot meet the requirement of aberration controlling for advanced lithography tools. This paper illustrates an approach using the property that deformation of a thin plate is similar to optical modes to realize a high fidelity multimode deformable mirror whose deformation has characteristics of optical aberration modes. The way to arrange actuators is also examined. In this paper, a 36-actuator deformable mirror is taken as an example to generate low-order Zernike modes. The result shows that this DM generates the fourth fringe Zernike mode (Z4) defocus, and primary aberration Z5-Z8 with an error less than 0.5%, generates the fifth-order aberration Z10-Z14, and generates the seventh-order aberration Z17-Z20 with an error less than 1.1%. The high fidelity replication of the Zernike mode indicates that the DM satisfies the demand of controlling aberrations corresponding to the first 20 Zernike modes in an advanced lithography tool. (C) 2015 Optical Society of America
学科主题	ADAPTIVE OPTICS; LOW-COST; LITHOGRAPHY; PERFORMANCE; UNIMORPH; MODES
收录类别	SCI
语种	英语
WOS记录号	WOS:000356101200023
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/4263]
专题	光电技术研究所_应用光学研究室（二室）
推荐引用方式 GB/T 7714	Zhou, Chao,Li, Yun,Wang, Anding,et al. Concept and modeling analysis of a high fidelity multimode deformable mirror[J]. APPLIED OPTICS,2015,54(17):5436-5443.
APA	Zhou, Chao,Li, Yun,Wang, Anding,&Xing, Tingwen.(2015).Concept and modeling analysis of a high fidelity multimode deformable mirror.APPLIED OPTICS,54(17),5436-5443.
MLA	Zhou, Chao,et al."Concept and modeling analysis of a high fidelity multimode deformable mirror".APPLIED OPTICS 54.17(2015):5436-5443.