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	Moiré fringe alignment using composite circular-line gratings for proximity lithography
	Xu, Feng1,2; Zhou, Shaolin3; Hu, Song4; Jiang, Wenbo5; Luo, Liang1,2; Chu, Hongyu1,2
刊名	Optics Express
	2015
卷号	23期号:16页码:20905-20915
ISSN号	1094-4086
中文摘要	We explore the feasibility of a controllable and easy-toimplement moiré-based composite circular-line gratings imaging scheme for optical alignment in proximity lithography. One circular grating and four line gratings located on both the mask alignment mark and wafer alignment mark are used to realize the coarse alignment and fine alignment respectively. The fundamental derivation of coarse alignment employing circular gratings and fine alignment employing line gratings are given. Any displacement of misalignment that occurs at the surface of two overlapped gratings can be sensed and determined through subsequent fringe phase analysis without the influence of the gap between the mask and the wafer or wafer process. The design and manufacture process of the alignment marks are presented. The experimental results validate and demonstrate the feasibility of the proposed approach. © 2015 Optical Society of America.
英文摘要	We explore the feasibility of a controllable and easy-toimplement moiré-based composite circular-line gratings imaging scheme for optical alignment in proximity lithography. One circular grating and four line gratings located on both the mask alignment mark and wafer alignment mark are used to realize the coarse alignment and fine alignment respectively. The fundamental derivation of coarse alignment employing circular gratings and fine alignment employing line gratings are given. Any displacement of misalignment that occurs at the surface of two overlapped gratings can be sensed and determined through subsequent fringe phase analysis without the influence of the gap between the mask and the wafer or wafer process. The design and manufacture process of the alignment marks are presented. The experimental results validate and demonstrate the feasibility of the proposed approach. © 2015 Optical Society of America.
学科主题	Optical constants - Optics
收录类别	SCI ; EI
语种	英语
WOS记录号	WOS:000361036400067
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7330]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.Faculty Information and Engineering, Southwest University of Science and Technology Mianyang, Sichuan, China 2.Robot Technology Used for Special Environment Key Laboratory of Sichuan Province, Mianyang, Sichuan, China 3.School of Electronics and Information, South China University of Technology, Guangzhou, China 4.Institute Optics and Electronics, Chinese Academy of Sciences, Chengdu, China 5.School of Electronics Engineering and Electronic Information, Xihua University, Chengdu, China
推荐引用方式 GB/T 7714	Xu, Feng,Zhou, Shaolin,Hu, Song,et al. Moiré fringe alignment using composite circular-line gratings for proximity lithography[J]. Optics Express,2015,23(16):20905-20915.
APA	Xu, Feng,Zhou, Shaolin,Hu, Song,Jiang, Wenbo,Luo, Liang,&Chu, Hongyu.(2015).Moiré fringe alignment using composite circular-line gratings for proximity lithography.Optics Express,23(16),20905-20915.
MLA	Xu, Feng,et al."Moiré fringe alignment using composite circular-line gratings for proximity lithography".Optics Express 23.16(2015):20905-20915.

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