Moiré-based phase imaging for sensing and adjustment of in-plane twist angle

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微电子装备总体研究室（四室）

	Moiré-based phase imaging for sensing and adjustment of in-plane twist angle
	Zhou, Shaolin 1; Xie, Changqing 2; Yang, Yong 3; Hu, Song 3; Xu, Xiangmin 4; Yang, Jun 5
刊名	IEEE Photonics Technology Letters
	2013
卷号	25 期号:18 页码:1847-1850
ISSN号	10411135
中文摘要	We explore the feasibility of a controllable and easyto- implement moirE´-based phase-sensitive imaging scheme for inplane twist angle sensing and adjustment between two parallel planes, e.g., the optical alignment in nanoimprint lithography, photolithography, and X-ray lithography. The fundamental derivation of in-plane twist angle detection is given. Any angle variations can be readily sensed and monitored by the phase shift of optical field that occurs at the surface of two overlapped gratings. The performances of a circular grating and a specially designed composite linear grating were tested. Computational and experimental results show that the in-plane twist angle can be readily sensed and remedied within the magnitude of 10-4 rad even in a manual operation mode by this method. © 1989-2012 IEEE.
英文摘要	We explore the feasibility of a controllable and easyto- implement moirE´-based phase-sensitive imaging scheme for inplane twist angle sensing and adjustment between two parallel planes, e.g., the optical alignment in nanoimprint lithography, photolithography, and X-ray lithography. The fundamental derivation of in-plane twist angle detection is given. Any angle variations can be readily sensed and monitored by the phase shift of optical field that occurs at the surface of two overlapped gratings. The performances of a circular grating and a specially designed composite linear grating were tested. Computational and experimental results show that the in-plane twist angle can be readily sensed and remedied within the magnitude of 10-4 rad even in a manual operation mode by this method. © 1989-2012 IEEE.
学科主题	Alignment - Lithography - Nanoimprint lithography - Photolithography
收录类别	SCI ; EI
语种	英语
WOS记录号	WOS:000324335500010
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7288]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	1.School of Electronic and Information Engineering, South China University of Technology, Department of Mechanical and Materials Engineering, London, ON N6A 5B9, Canada 2.Key Laboratory of Microelectronics Devices and Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China 3.State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China 4.School of Electronic and Information Engineering, South China University of Technology, Guangdong 510641, China 5.Department of Mechanical and Materials Engineering, Western University, University of Western Ontario, London, ON N6A 5B9, Canada
推荐引用方式 GB/T 7714	Zhou, Shaolin,Xie, Changqing,Yang, Yong,et al. Moiré-based phase imaging for sensing and adjustment of in-plane twist angle[J]. IEEE Photonics Technology Letters,2013,25(18):1847-1850.
APA	Zhou, Shaolin,Xie, Changqing,Yang, Yong,Hu, Song,Xu, Xiangmin,&Yang, Jun.(2013).Moiré-based phase imaging for sensing and adjustment of in-plane twist angle.IEEE Photonics Technology Letters,25(18),1847-1850.
MLA	Zhou, Shaolin,et al."Moiré-based phase imaging for sensing and adjustment of in-plane twist angle".IEEE Photonics Technology Letters 25.18(2013):1847-1850.