Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography

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	Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography
	Shaolin Zhou; Yong Yang; Lixin Zhao; Song Hu
刊名	Optics Letters
	2010
卷号	35 期号:18 页码:3132-3134
通讯作者	Shaolin Zhou
中文摘要	We demonstrate a tilt-modulated phase imaging method to adjust the gap inconsistency for wafer-mask leveling in proximity lithography. Two gratings with close periods are etched on the mask and used as leveling marks. At the illumination of a monochromatic planar wave, the diffracted image of one grating is projected back onto the other one beside it through reflection at the wafer surface. Any wafer-mask tilts in two orthogonal sections are directly modulated into the phase distribution of the interference field and can be directly remedied according to the frequency and angle deviation of the two sets of fringes. Finally, wafer-mask leveling can be achieved at only one spot with preserved accuracy. Computational and experimental results confirm that tilts at the magnitude of 10/sup -3/ rad can be readily resolved by this method.
英文摘要	We demonstrate a tilt-modulated phase imaging method to adjust the gap inconsistency for wafer-mask leveling in proximity lithography. Two gratings with close periods are etched on the mask and used as leveling marks. At the illumination of a monochromatic planar wave, the diffracted image of one grating is projected back onto the other one beside it through reflection at the wafer surface. Any wafer-mask tilts in two orthogonal sections are directly modulated into the phase distribution of the interference field and can be directly remedied according to the frequency and angle deviation of the two sets of fringes. Finally, wafer-mask leveling can be achieved at only one spot with preserved accuracy. Computational and experimental results confirm that tilts at the magnitude of 10/sup -3/ rad can be readily resolved by this method.
语种	英语
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/7235]
专题	光电技术研究所_微电子装备总体研究室（四室）
作者单位	中国科学院光电技术研究所
推荐引用方式 GB/T 7714	Shaolin Zhou,Yong Yang,Lixin Zhao,et al. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography[J]. Optics Letters,2010,35(18):3132-3134.
APA	Shaolin Zhou,Yong Yang,Lixin Zhao,&Song Hu.(2010).Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography.Optics Letters,35(18),3132-3134.
MLA	Shaolin Zhou,et al."Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography".Optics Letters 35.18(2010):3132-3134.