Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films

CORC > 广州能源研究所 > 中国科学院广州能源研究所 > 中国科学院广州能源研究所

	Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films
	Xiao, Xiudi 1,2; Miao, Lei 1; Zhang, Ming 1; Xu, Gang 1; Shao, Jianda 2; Fan, Zhengxiu 2
刊名	journal of nanoscience and nanotechnology
	2013-02-01
卷号	13 期号:2 页码:824-828
关键词	TiO2 Thin Films Residual Stress Anisotropic Laser-Induced Damage Raman Spectra
英文摘要	the residual stress and laser-induced damage threshold (lidt) of tio2 sculptured thin films prepared by glancing angle electron beam evaporation were studied. uv-vis-nir spectra and optical interferometer were employed to characterize the optical and mechanical properties, respectively. optical microscopy and raman spectra were used to observe damage morphology and analyze damage microstructure, respectively. it was found that the residual stress changed from compressive into tensile with increasing deposition angle. the lidt was anisotropic with p- and s-polarization light, which was due to the anisotropic nanostructure and optical properties. simultaneously, an optimum deposition angle for the maximum threshold of tio2 film was about 60 degrees. the mechanism of laser-induced damage was thermal in nature. the process of thermal damage with crystallization is proved by raman spectra.
WOS标题词	science & technology ; physical sciences ; technology
类目[WOS]	chemistry, multidisciplinary ; nanoscience & nanotechnology ; materials science, multidisciplinary ; physics, applied ; physics, condensed matter
研究领域[WOS]	chemistry ; science & technology - other topics ; materials science ; physics
关键词[WOS]	glancing angle deposition ; optical-properties ; coatings ; microstructure ; silicon
收录类别	SCI
语种	英语
WOS记录号	WOS:000318254500019
内容类型	期刊论文
源URL	[http://ir.giec.ac.cn/handle/344007/10044]
专题	中国科学院广州能源研究所
作者单位	1.Chinese Acad Sci, Guangzhou Inst Energy Convers, Key Lab Renewable Energy & Gas Hydrates, Guangzhou 510640, Guangdong, Peoples R China 2.Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Shanghai 201800, Peoples R China
推荐引用方式 GB/T 7714	Xiao, Xiudi,Miao, Lei,Zhang, Ming,et al. Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films[J]. journal of nanoscience and nanotechnology,2013,13(2):824-828.
APA	Xiao, Xiudi,Miao, Lei,Zhang, Ming,Xu, Gang,Shao, Jianda,&Fan, Zhengxiu.(2013).Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films.journal of nanoscience and nanotechnology,13(2),824-828.
MLA	Xiao, Xiudi,et al."Anisotropic Laser-Induced Damage Threshold and Residual Stress of TiO2 Sculptured Thin Films".journal of nanoscience and nanotechnology 13.2(2013):824-828.