Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films | |
Meng, Fanping ; Peng, Shou ; Xu, Genbao ; Wang, Yun ; Ge, Fangfang ; Huang, Feng | |
刊名 | JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
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2015 | |
卷号 | 33期号:6页码:- |
ISSN号 | 0734-2101 |
公开日期 | 2016-09-18 |
内容类型 | 期刊论文 |
源URL | [http://ir.nimte.ac.cn/handle/174433/12282] ![]() |
专题 | 宁波材料技术与工程研究所_2015专题 |
推荐引用方式 GB/T 7714 | Meng, Fanping,Peng, Shou,Xu, Genbao,et al. Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2015,33(6):-. |
APA | Meng, Fanping,Peng, Shou,Xu, Genbao,Wang, Yun,Ge, Fangfang,&Huang, Feng.(2015).Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,33(6),-. |
MLA | Meng, Fanping,et al."Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 33.6(2015):-. |
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