Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films

	Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films
	Meng, Fanping ; Peng, Shou ; Xu, Genbao ; Wang, Yun ; Ge, Fangfang ; Huang, Feng
刊名	JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
	2015
卷号	33 期号:6 页码:-
ISSN号	0734-2101
公开日期	2016-09-18
内容类型	期刊论文
源URL	[http://ir.nimte.ac.cn/handle/174433/12282]
专题	宁波材料技术与工程研究所_2015专题
推荐引用方式 GB/T 7714	Meng, Fanping,Peng, Shou,Xu, Genbao,et al. Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,2015,33(6):-.
APA	Meng, Fanping,Peng, Shou,Xu, Genbao,Wang, Yun,Ge, Fangfang,&Huang, Feng.(2015).Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films.JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,33(6),-.
MLA	Meng, Fanping,et al."Optimizing the discharge voltage in magnetron sputter deposition of high quality Al-doped ZnO thin films".JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 33.6(2015):-.