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题名	电子与固体相互作用的Monte Carlo模拟; 电子与固体相互作用的Monte Carlo模拟
作者	1黄秀荪,电工研究所
学位类别	硕士
答辩日期	2004
授予单位	中国科学院电工研究所
导师	1顾文琪,电工研究所
关键词	电子束曝光 电子散射 Monte Carlo方法 模拟 electron beam lithography electron scattering Monte Carlo method simulation
其他题名	电子与固体相互作用的Monte Carlo模拟
学位专业	电力电子与电力传动
中文摘要	针对电子束曝光领域影响曝光分辨率的一个重要原因一电子在口体中的散射；从电子与团体物质的相互作用机理入手进行分析，分析相互作用的各种结果。选用经典能量连续损失物理模型，即Ruherford弹性散射和Bethe能量损失，分析电子在固体物质中的弹性散射和非弹性散射，电子的射程及能量损失规律。根据选定的物理模型，采用MonteCarlo方法对电子与固体物质的相互作用过程进行模拟。给定电子剂量，确定抗蚀剂吸收能量密度，选用抗蚀剂的能量阈值模型确定抗蚀剂受到电子辐照后能否被显影。本文着重讨论了用计算机实现模型的问题，包括：（1）计算流程确定；（2）坐标转换；（3）随机数的产生、如何避免数据逸出、存储空间的合理利用、如何在训一算机环境规定的矩阵容量内实现程序等细节问题的处理；（4）大量数据的存储和读取；（5）数据与空间坐标的一一对应；（6）画电子散射轨迹图、抗蚀剂能量吸收留。抗蚀剂显影图。分析计算机模拟结果与实验结果，得出结论。 Focusing on an important reason, i.e. the scattering of electrons in solid, which influence the resolution of electron beam lithography, the interactions of electrons and solid are analyzed based on the mechanism of the interactions. A classic continuous energy loss physical model, which is Rutherford elastic scattering and Bethe energy loss model, is adopted to analyze the elastic and inelastic scattering, range, energy loss of electrons injected into solid. According to the physical model, Monte Carlo method is applied to simulate the interactions of electrons and solid. For a given dose of electrons, the energy density absorbed by the resist is determined, and a resist critical energy density model is adopted to determine whether the resist the resist can be developed after electrons irradiation. This paper mainly discuses the problems of realizing the model by computer, which can be listed as follows: (l)The computation flow is defined; (2)The coordinate transformation is realized; (3)Some details like the generation of probabilistic number, the overflow of computation, the utilize of memory, how to program within the number range of matrix of the computing environment are discussed; (4)How to read and store a large number of figures; (5)How to map figures with space; (6)How to plot the figure of electron track, the figure of the energy absorbed by resist, the profile of the developed resist. Analyzing the results derived by computer simulation and experiments, conclusions are deduced.
语种	中文
公开日期	2010-10-18
页码	61
内容类型	学位论文
源URL	[http://ir.iee.ac.cn/handle/311042/7363]
专题	电工研究所_其他部门_其他部门_硕士学位论文
推荐引用方式 GB/T 7714	1黄秀荪,电工研究所. 电子与固体相互作用的Monte Carlo模拟, 电子与固体相互作用的Monte Carlo模拟[D]. 中国科学院电工研究所. 2004.

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