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题名	基于SEM的电子束曝光软件系统研究; 基于SEM的电子束曝光软件系统研究
作者	1魏淑华,电工研究所
学位类别	博士
答辩日期	2008-06-04
授予单位	中国科学院电工研究所
导师	1韩立,电工研究所
关键词	电子束曝光 软件系统 数据格式 图形分割 邻近效应校正 Electron beam lithography Software system Exposure data format Graphics segmentation Proximity effect correction
其他题名	基于SEM的电子束曝光软件系统研究
中文摘要	电子束曝光技术是微纳加工技术研究与开发应用的关键技术，在微电子、微光学、微机械等微纳米加工领域有着广泛的应用前景。实现该技术的电子束曝光系统是一套复杂的半导体加工设备，为保障其正常协调工作，必须有一套功能完备、操作便捷的软件系统。因此，本文开展了电子束曝光软件系统的研究，对其涉及到的关键性技术进行了详细阐述和深入分析，进而提出了合理的算法设计，自主研制开发了一套实用化的软件系统，最后利用该系统在基于SEM的电子束曝光系统平台上进行了曝光实验。 本文首先分析了基于SEM的电子束曝光系统特点，从实用化的角度出发，提出了软件系统的功能需求。对软件系统的必要功能——数据格式转换技术进行了研究，提出了一种适用于本电子束曝光系统的数据格式，设计了集成电路版图源文件的解析方式，针对曝光版图特点和计算效率要求，提出了完备高效的图形分割和处理算法。对邻近效应产生机制和校正技术进行了研究，提出了一种利用矩阵寻址方式求解曝光版图能量分布，进而调整各区域曝光剂量的校正方法。对电子束曝光中的对准校正技术进行了研究，设计了对扫描场畸变和坐标系进行校正的软件实现方法。以提出的算法设计为依据，在Visual C++6.0开发环境下完成了软件系统的开发。最后利用该软件系统进行了曝光实验，验证了软件系统的可靠性与易操作性。 本课题为实用化研究课题，该课题的完成对填补国内此领域技术空白有重要意义。所实现的软件系统功能完备，界面友好，可完成实验曝光版图设计、曝光数据文件生成，对硬件设备进行检测校正，控制曝光的整个过程，在基于SEM的电子束曝光系统中发挥了重要作用。该软件系统已获得国家版权局的计算机软件著作权保护。 The electron beam lithography is a key technology in the research and applications of Micro-Nanofabrication technologies. It has a great potential to be used in the micro-electronics, micro-optics, micro-machinics and most other Micro-Nanofabrication fields. The electron beam lithography system is a set of complicated semiconductor machining equipment, which needs a fully functional and easy-operational software system to ensure it run correctly. Therefore, the aim of this dissertation is to provide the development of a practical software system for the electron beam lithography independently. By investigating thoroughly and systematically the electron beam lithography software system, the key technologies used in this field are analyzed and reasonable algorithms are designed. Exposure experiments have been done on the electron beam lithography system platform using this software system. This dissertation first analyzes the characteristics of the electron beam lithography system based on SEM, and then proposes the functional requirements of the software system from a practical point of view. Then, based on the investigation of the data format conversion mechanism of the software system, a new file format for the Nano-electron beam lithography system is designed. After that, an analytical method for the integrated circuits layout files is proposed, and then effective graphics segmentation and processing algorithms are designed and given out. Moreover, after the thoroughly investigation of the production mechanism and the correction technology of proximity effect, a new exposure dose modulation correction approach is presented, which calculate the energy distribution of the exposure layout by the use of matrix addressing and then modulate the exposure dose distribution. The alignment correction technology of electron beam lithography has also been analyzed and based on this, the correction approaches for the scanning field distortion and coordinates distortion are proposed, and then the software implementation methods are designed. The Nano-electron beam lithography software system designed by us is developed based on Visual C++ 6.0 development environment. In the end of our work, exposure experiments have been done on the Nano-electron beam lithography system platform, whose results show its reliability and easy operability. This dissertation topic is a kind of practical research, whose accomplishment is of great significance in this field. This electron beam lithography software system designed by this dissertation has fully functional and friendly operational, who has the following functions: designing the complete layout; generating the exposure data file; detecting and correcting the hardware, and controlling the whole process of exposure. This software system plays an important role in the electron beam lithography system based on SEM. The software system provided in this dissertation has been protected by the compute software copyright of the National Copyright Administration.
语种	中文
公开日期	2010-10-18
页码	150
分类号	TM1;TM921
内容类型	学位论文
源URL	[http://ir.iee.ac.cn/handle/311042/6776]
专题	电工研究所_其他部门_其他部门_博士学位论文
推荐引用方式 GB/T 7714	1魏淑华,电工研究所. 基于SEM的电子束曝光软件系统研究, 基于SEM的电子束曝光软件系统研究[D]. 中国科学院电工研究所. 2008.

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