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题名纳米压印工艺技术研究; 纳米压印工艺技术研究
作者1司卫华,电工研究所
学位类别博士
答辩日期2008-11-26
授予单位中国科学院电工研究所
导师1顾文琪,电工研究所
关键词纳米压印 模板 聚合物 流动模型 紫外压印 微型燃料电池 导流板 Nano-imprint lithography Stamp Polymer Flow model UV-imprint lithography Minisize fuel cell Flowfield plate.
其他题名纳米压印工艺技术研究
中文摘要纳米压印技术是一种全新的纳米结构制备技术,具有分辨率高、效率高、成本低的优点,它为半导体器件制作提供了一个新的解决方案。随着半导体业朝着不断缩小特征尺寸方向发展,随之而来的技术进步导致了设备的成本以指数增长。由于成本的增长,人们对纳米压印光刻这一低成本图形转移技术的关注越来越多。 本文介绍了纳米技术的发展历程和研究现状,纳米压印的工作原理和遇到的困难和挑战。对纳米压印中需要的模板和聚合物进行了研究。提出了纳米压印模板所要具备的条件,模板的硬度、热膨胀系数和抗粘性等对图形转印的影响,制备出了几种不同类型的压印模板。分析了聚合物的填充机理和温度、压力对聚合物填充的影响。根据聚合物的流动模型理论,假定在温度不变的条件下,对压印各参数之间的关系进行仿真,确定热压印的合理参数。介绍了紫外压印技术的原理和工艺,并对紫外压印中需要的模板和聚合物的选择进行了分析。用自行研制的UVNIL-01型紫外压印机,分别在纸质硬板上和石英玻璃上做了紫外压印实验,成功制作出了具有100nm特征尺寸的图形。用纳米压印技术制作了微型燃料电池的导流板,成功制作了200μm宽的直流通道和800μm宽的直流通道,并用自呼吸式燃料电池对导流板进行了验证。 As the semiconductor industry follows the trend of making feature size smaller, the demands for high resolution, high efficiency and low cost nano lithographic techniques have increased. Nano-imprint lithography is considered as one of the candidates showing high potential for nanofabrication. In this thesis, the basic principles of nano-imprint technology and present development status of nano-imprint lithography are firstly reviewed. Secondly, the nano-imprint stamp and polymer are investigated and confirmed by an extended series of experiments. Factors such as the stamp rigidity, heat expanding coefficient and resist viscidity, are analyzed, which influence the precision of pattern transferring. Several stamp of nano-imprint are fabricated. The impact of pressure, time, and temperature on polymer filling are investigated. According to flow model theory of polymer, the relationship between those parameters and height are simulated under the condition of fixed temperature and the proper parameter value are founded. Thirdly, the principle and processing of UV-imprint technology is introduced. The key point of stamp and polymer used to UV-imprint are analyzed. The pattern with 100nm feature size is transferred to rigidity paper substrate and quartz glass substrate by self-made UVNIL-01 imprint equipment. Finally, the flowfield plate of minisize fuel cell is fabricated using nano-imprint lithography, which width of straight channels is 200μm and 800μm. The flowfield plates are proved in effect with self-breath minisize fuel cell.
语种中文
公开日期2010-10-18
页码126
分类号TM1;TM921
内容类型学位论文
源URL[http://ir.iee.ac.cn/handle/311042/6746]  
专题电工研究所_其他部门_其他部门_博士学位论文
推荐引用方式
GB/T 7714
1司卫华,电工研究所. 纳米压印工艺技术研究, 纳米压印工艺技术研究[D]. 中国科学院电工研究所. 2008.
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