Deep silicon grating as high-extinction-ratio polarizing beam splitter

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	Deep silicon grating as high-extinction-ratio polarizing beam splitter
	Jijun Feng ; Changhe Zhou ; Bo Wang ; Jiangjun Zheng
刊名	chinese optics letters
	2009-04-10
卷号	7 期号:4 页码:324-328
合作状况	其它
中文摘要	a deep binary silicon grating as high-extinction-ratio reﬂective polarizing beam splitter (pbs) at the wavelength of 1550 nm is presented. the design is based on the phenomenon of total internal reﬂection (tir) by using the rigorous coupled wave analysis (rcwa). the extinction ratio of the rectangular pbs grating can reach 2.5×105 with the optimum grating period of 397 nm and groove depth of 1.092 μm. the effciencies of tm-polarized wave in the 0th order and te-polarized wave in the −1st order can both reach unity at the littrow angle. holographic recording technology and inductively coupled plasma (icp) etching could be used to fabricate the silicon pbs grating.
学科主题	光电子技术
收录类别	SCI+EI
语种	中文
公开日期	2010-05-14
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/6832]
专题	上海光学精密机械研究所_信息光学开放实验室
推荐引用方式 GB/T 7714	Jijun Feng,Changhe Zhou,Bo Wang,et al. Deep silicon grating as high-extinction-ratio polarizing beam splitter[J]. chinese optics letters,2009,7(4):324-328.
APA	Jijun Feng,Changhe Zhou,Bo Wang,&Jiangjun Zheng.(2009).Deep silicon grating as high-extinction-ratio polarizing beam splitter.chinese optics letters,7(4),324-328.
MLA	Jijun Feng,et al."Deep silicon grating as high-extinction-ratio polarizing beam splitter".chinese optics letters 7.4(2009):324-328.