High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies

	High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies
	Li, CH; Ju, X; Jiang, XD; Huang, J; Zhou, XD; Zheng, Z; Wu, WD; Zheng, WG; Li, ZX; Wang, BY
刊名	OPTICS EXPRESS
	2011
卷号	19 期号:7 页码:6447-6457
通讯作者	[Li, C. H. ; Ju, X.] Univ Sci & Technol Beijing, Dept Phys, Beijing 100083, Peoples R China ; [Li, C. H. ; Jiang, X. D. ; Huang, J. ; Zhou, X. D. ; Zheng, Z. ; Wu, W. D. ; Zheng, W. G.] CAEP, Res Ctr Laser Fus, Mianyang 621900, Peoples R China ; [Li, Z. X. ; Wang, B. Y.] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China ; [Yu, X. H.] Shanghai Synchrotron Radiat Facil, Shanghai 201800, Peoples R China
英文摘要	We report on the characterization of modifications in fused silica after exposure to low fluence (2 J/cm(2)) 355 nm laser at repetition frequencies of 1 Hz, 5 Hz and 10 Hz. Synchrotron based XRF spectroscopy is employed to study concentration variation of metal inclusions in the surface layer. Positron annihilation lifetime spectroscopy is used to probe atomic size defects variation in bulk silica. FT-IR is used to characterize changes of bond length and angle of Si-O-Si covalent bond of irradiated silica. Compared to the basic frequency, the big loss of cerium and iron concentration, the size enlargement of vacancy cluster and the decrease of Si-O-Si covalent bond length after 10 Hz laser irradiation are illustrated by our data. These tiny modifications provide important data to investigate laser damage mechanism. (C) 2011 Optical Society of America
学科主题	Optics
类目[WOS]	Optics
研究领域[WOS]	Optics
原文出处	SCI
语种	英语
WOS记录号	WOS:000288852700078
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/240076]
专题	高能物理研究所_多学科研究中心高能物理研究所_核技术应用研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Li, CH,Ju, X,Jiang, XD,et al. High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies[J]. OPTICS EXPRESS,2011,19(7):6447-6457.
APA	Li, CH.,Ju, X.,Jiang, XD.,Huang, J.,Zhou, XD.,...&王宝义.(2011).High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies.OPTICS EXPRESS,19(7),6447-6457.
MLA	Li, CH,et al."High resolution characterization of modifications in fused silica after exposure to low fluence 355 nm laser at different repetition frequencies".OPTICS EXPRESS 19.7(2011):6447-6457.