Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering

	Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering
	Zhang, L; Shi, LQ; He, ZJ; Zhang, B; Lu, YF; Liu, A; Wang, BY; Wang BY(王宝义)
刊名	SURFACE & COATINGS TECHNOLOGY
	2009
卷号	203 期号:22 页码:3356-3360
关键词	Ti thin film Magnetron sputtering ECR plasma
通讯作者	[Zhang, Lei. ; Shi, L. Q. ; He, Z. J. ; Zhang, B. ; Lu, Y. F. ; Liu, A.] Fudan Univ, Inst Modern Phys, Appl Ion Beam Phys Lab, Shanghai 200433, Peoples R China ; [Wang, B. Y.] Chinese Acad Sci, Inst High Energy Phys, Beijing 100049, Peoples R China
英文摘要	We report high quality Ti films grown in a novel electron cyclotron resonance (ECR) plasma-assisted magnetron sputtering (PMS) deposition system. The films are compared with films deposited by conventional direct current (DC) magnetron sputtering. Using ECR-PMS, the argon plasma bombardment energy and Ti film deposition rate can be controlled separately, with the substrate bias voltage under feedback control. Results from SEM, AFM, XRD and PAS (scanning electron microscopy, atomic force microscopy, X-ray diffraction and positron annihilation spectroscopy) show that the properties of Ti films prepared by ECR-PMS are greatly improved compared with conventional sputtering. SEM and AFM confirmed that ECR-PMS Ti films have a dense, smooth, mirror-like surface. Increasing the substrate bias of the ECR plasma from - 23 V to - 120 V while keeping a fixed sputtering bias voltage of - 40 V, the intensity of the (100) reflection of Ti film was a little strengthened, but (002) remained strongly preferred orientation. The XRD peak broadening of ECR-PMS Ti films is more than for conventional magnetron sputtering, due to grain refinement induced by At ion bombardment. Doppler broadening of PAS analysis reveals that the Ti films have fewer vacancy defects compared with films prepared by the conventional magnetron. (C) 2009 Elsevier B.V. All rights reserved.
学科主题	Materials Science; Physics
类目[WOS]	Materials Science, Coatings & Films ; Physics, Applied
研究领域[WOS]	Materials Science ; Physics
原文出处	SCI
语种	英语
WOS记录号	WOS:000268044700005
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/239896]
专题	高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Zhang, L,Shi, LQ,He, ZJ,et al. Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering[J]. SURFACE & COATINGS TECHNOLOGY,2009,203(22):3356-3360.
APA	Zhang, L.,Shi, LQ.,He, ZJ.,Zhang, B.,Lu, YF.,...&王宝义.(2009).Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering.SURFACE & COATINGS TECHNOLOGY,203(22),3356-3360.
MLA	Zhang, L,et al."Deposition of dense and smooth Ti films using ECR plasma-assisted magnetron sputtering".SURFACE & COATINGS TECHNOLOGY 203.22(2009):3356-3360.