Mo/SiO2 multilayers for soft x-ray optical applications

	Mo/SiO2 multilayers for soft x-ray optical applications
	Wang, FP; Wang, PX; Lu, KQ; Fang, ZZ; Gao, M; Duan, XF; Cui, MQ; Ma, HJ; Jiang, XM; Cui MQ(崔明启)
刊名	JOURNAL OF APPLIED PHYSICS
	1999
卷号	85 期号:6 页码:3175-3179
通讯作者	Chinese Acad Sci, Inst Phys, Beijing 100080, Peoples R China ; Chinese Acad Sci, Ctr Condensed Matter Phys, Beijing 100080, Peoples R China ; Beijing Univ Sci & Technol, Dept Phys Mat, Beijing 100083, Peoples R China ; Beijing Lab Electron Microscopy, Beijing 100080, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Beijing 100039, Peoples R China
英文摘要	The optimal reflectivity of soft-x-ray multilayers made of new pairs of materials was theoretically calculated in the wavelength range of 2.0-4.5 nm. Molybdenum and silicon dioxide were then selected for "high index'' and "low index'' layer, respectively, in the multilayer system. The microstructures and composition profiles of multilayers of molybdenum and silicon dioxide were investigated by means of low-angle x-ray diffraction, cross-sectional high resolution electron microscopy, an energy-filtering transmission electron microscope elemental mapping, and Auger electron spectrometry. The results show that no diffusion of Si into Mo layers has occurred, and only slight diffusion of O into Mo layers are seen. Sharp and relatively smooth interfaces have formed. With increasing number of layers, the interfacial roughness was propagated through the multilayer stack and low-frequency roughness increases while the high-frequency roughness decreases. (C) 1999 American Institute of Physics. [S0021-8979(99)00406-5].
学科主题	Physics
类目[WOS]	Physics, Applied
研究领域[WOS]	Physics
原文出处	SCI
语种	英语
WOS记录号	WOS:000079021200024
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/239879]
专题	高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Wang, FP,Wang, PX,Lu, KQ,et al. Mo/SiO2 multilayers for soft x-ray optical applications[J]. JOURNAL OF APPLIED PHYSICS,1999,85(6):3175-3179.
APA	Wang, FP.,Wang, PX.,Lu, KQ.,Fang, ZZ.,Gao, M.,...&姜晓明.(1999).Mo/SiO2 multilayers for soft x-ray optical applications.JOURNAL OF APPLIED PHYSICS,85(6),3175-3179.
MLA	Wang, FP,et al."Mo/SiO2 multilayers for soft x-ray optical applications".JOURNAL OF APPLIED PHYSICS 85.6(1999):3175-3179.