Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source

	Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source
	Gong, Y; Chen, B; Ni, QL; Cui, MQ; Zhao, YD; Wu, ZH; Cui MQ(崔明启); Zhao YD(赵屹东); Wu ZH(吴忠华)
刊名	HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION
	2005
卷号	29 期号:11 页码:1104-1106
关键词	synchrotron radiation source glazing exit X-ray fluorescence thin film
通讯作者	CAS, State Key Lab Appl Opt, Inst Opt, Changchun 130033, Peoples R China ; CAS, Inst High Energy Phys, Beijing 100049, Peoples R China
英文摘要	The grazing exit X-ray fluorescence provides a possibility to analyze the characteristics of thin film and, multilayer, especially the thickness, interface structure and composition. The Cr film samples with different thickness deposited on silicon (Si) bases are tested with grazing method using Beijing synchrotron radiation source (SR) as excitation light. The results agree with the theoretical prediction, and the interference of emitted X-ray has been observed.
学科主题	Physics
类目[WOS]	Physics, Nuclear ; Physics, Particles & Fields
研究领域[WOS]	Physics
原文出处	SCI
语种	英语
WOS记录号	WOS:000233323300016
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/239050]
专题	高能物理研究所_加速器中心高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Gong, Y,Chen, B,Ni, QL,et al. Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source[J]. HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,2005,29(11):1104-1106.
APA	Gong, Y.,Chen, B.,Ni, QL.,Cui, MQ.,Zhao, YD.,...&吴忠华.(2005).Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source.HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION,29(11),1104-1106.
MLA	Gong, Y,et al."Thickness analysis for thin-film by glazing exit X-ray fluorescence with synchrotron radiation source".HIGH ENERGY PHYSICS AND NUCLEAR PHYSICS-CHINESE EDITION 29.11(2005):1104-1106.