Pb surfactant-assisted Co film growth on Cu(111)

	Pb surfactant-assisted Co film growth on Cu(111)
	Xu, MC; Qian HJ(钱海杰); Liu FQ(刘凤琴); Kui RX(奎热西); Qian, HJ; Liu, FQ; Krash, I; Lai, WY; Wu, SC
刊名	CHINESE PHYSICS LETTERS
	2000
卷号	17 期号:8 页码:595-597
通讯作者	Chinese Acad Sci, Inst Phys, Ctr Condensed Matter Phys, State Key Lab Magnetism, Beijing 100080, Peoples R China ; Chinese Acad Sci, Inst High Energy Phys, Synchrotron Radiat Lab, Beijing 100039, Peoples R China ; Peking Univ, Dept Phys, Beijing 100871, Peoples R China
英文摘要	Surfactant-assisted Co film epitaxy growth on Cu (111) using Pb as a surfactant was studied by means of Auger electron spectra and synchrotron radiation photoemission spectra. The results reveal that with increasing the Co thickness most of the Pb atoms always float on the surface. Compared with 0.7 ML (monolayer) Pb, the Co film with 1.5 ML Pb surfactant has more layer-by-layer growth on Cu(111). The predeposited Pb layer can suppress the intralayer diffusion on the Cu(111) surface and effectively increase the Co island density at the initial stage of Co growth. On the contrary, a Pb-Co surface alloy was found during the Co film growth; this may hinder the interlayer diffusion of the deposited Co atoms, which is unfavorable to the layer-by-layer growth. The Pb-Co is also considered to be the main reason why some Pb atoms have been buried in the Co films.
学科主题	Physics
类目[WOS]	Physics, Multidisciplinary
研究领域[WOS]	Physics
原文出处	SCI
语种	英语
WOS记录号	WOS:000088961900018
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/238064]
专题	高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Xu, MC,Qian HJ,Liu FQ,et al. Pb surfactant-assisted Co film growth on Cu(111)[J]. CHINESE PHYSICS LETTERS,2000,17(8):595-597.
APA	Xu, MC.,钱海杰.,刘凤琴.,奎热西.,Qian, HJ.,...&Wu, SC.(2000).Pb surfactant-assisted Co film growth on Cu(111).CHINESE PHYSICS LETTERS,17(8),595-597.
MLA	Xu, MC,et al."Pb surfactant-assisted Co film growth on Cu(111)".CHINESE PHYSICS LETTERS 17.8(2000):595-597.