Graphene Oxide—a Surprisingly Good Nucleation Seed and Adhesion Promotion Agent for One—Step ZnO Lithography and Optoelectronic Applications

	Graphene Oxide—a Surprisingly Good Nucleation Seed and Adhesion Promotion Agent for One—Step ZnO Lithography and Optoelectronic Applications
	QiangMa; XuejieZhu; Zhang DD(张豆豆); Liu SZ(刘生忠)
刊名	Journal of Materials Chemistry C
	2015
卷号	2 期号:1 页码:8956
通讯作者	刘生忠
学科主题	物理化学
公开日期	2016-05-09
内容类型	期刊论文
源URL	[http://cas-ir.dicp.ac.cn/handle/321008/143873]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
作者单位	大连化学物理研究所
推荐引用方式 GB/T 7714	QiangMa,XuejieZhu,Zhang DD,et al. Graphene Oxide—a Surprisingly Good Nucleation Seed and Adhesion Promotion Agent for One—Step ZnO Lithography and Optoelectronic Applications[J]. Journal of Materials Chemistry C,2015,2(1):8956.
APA	QiangMa,XuejieZhu,张豆豆,&刘生忠.(2015).Graphene Oxide—a Surprisingly Good Nucleation Seed and Adhesion Promotion Agent for One—Step ZnO Lithography and Optoelectronic Applications.Journal of Materials Chemistry C,2(1),8956.
MLA	QiangMa,et al."Graphene Oxide—a Surprisingly Good Nucleation Seed and Adhesion Promotion Agent for One—Step ZnO Lithography and Optoelectronic Applications".Journal of Materials Chemistry C 2.1(2015):8956.